Txais tos rau peb lub vev xaib!

CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Cobalt Hlau Tantalum Zirconium

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

CoFeTaZr

Kev sib xyaw

Cobalt Hlau Tantalum Zirconium

Purity

99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting

Muaj Qhov Loj

L≤200mm, W≤200mm


Product Detail

Khoom cim npe

Cobalt Iron Tantalum Zirconium sputtering lub hom phiaj yog tsim los ntawm lub tshuab nqus tsev melting. Cov txheej txheem tsim khoom no tuaj yeem tiv thaiv cov ntsiab lus tseem ceeb ntawm oxidation thiab ua kom homogenous microstructure, uniformed grain loj thiab siab sib xws ntawm cov yeeb yaj kiab tso.

Tom qab kev kho cua sov, PTF ntawm lub hom phiaj tuaj yeem txhim kho tau zoo, yog li nws feem ntau siv rau cov khoom siv sib nqus mos hauv cov txheej txheem sib nqus sib nqus.

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom Sputtering Target thiab tuaj yeem tsim Cobalt Iron Tantalum Zirconium Sputtering Materials raws li cov neeg siv khoom tshwj xeeb. Yog xav paub ntxiv, thov hu rau peb.


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