Txais tos rau peb lub vev xaib!

CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Txheej Custom Made

Cobalt Chromium Tantalum

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

CoCrTa

Kev sib xyaw

Cobalt Chromium Tantalum

Purity

99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting

Muaj Qhov Loj

L≤200mm, W≤200mm


Product Detail

Khoom cim npe

Cobalt Chromium Tantalum sputtering lub hom phiaj yog tsim los ntawm cov txheej txheem casting thiab lub tshuab nqus tsev melting. thiab ces tsim rau hauv lub hom phiaj hom. Nws muaj siab purity thiab homogenous microstructure. Co-Cr-Ta siv los ua cov khoom tseem ceeb rau cov ntaub ntawv sib nqus rau nws cov khoom sib nqus: siab coercivity, tsis tshua muaj suab nrov thiab zoo squareness.

Cov Khoom Muag Khoom Tshwj Xeeb Tshwj Xeeb tshwj xeeb hauv Kev Tsim Khoom Sputtering Target thiab tuaj yeem tsim cov khoom siv cobalt Chromium Tantalum Sputtering raws li cov neeg siv khoom tshwj xeeb. Yog xav paub ntxiv, thov hu rau peb.


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