Txais tos rau peb lub vev xaib!

AlTa Sputtering Target High Purity nyias zaj duab xis PVD txheej Custom Made

Aluminium-Tantalum

Lus piav qhia luv luv:

Qeb

Alloy Sputtering Target

Tshuaj Formula

AlTa

Kev sib xyaw

Aluminium-Tantalum

Purity

99.9%, 99.95%, 99.99%

Cov duab

Phaj, Kem Hom Phiaj, arc cathodes, Custom-made

Txheej txheem ntau lawm

Nqus Melting, PM

Muaj Qhov Loj

L≤200mm, W≤200mm


Product Detail

Khoom cim npe

Lub hom phiaj yog npaj los ntawm kev sib xyaw Aluminium thiab Tantalum hmoov los yog lub tshuab nqus tsev melting ua raws li kev cog lus kom tag nrho. Yog li cov ntaub ntawv compacted yog xaiv tau sintered thiab tom qab ntawd tsim rau hauv cov hom phiaj xav tau.

Aluminium Tantalum sputtering lub hom phiaj muaj siab purity, homogeneous microstructure thiab zoo heev conductivity. Nws yog siv dav hauv kev tsim cov yeeb yaj kiab nyias rau kev lag luam vaj huam sib luag. Aluminium Tantalum kuj tseem tuaj yeem muab ntxiv los tsim kev ua haujlwm siab Titanium alloy los txhim kho nws qhov kub thiab txias.

Cov ntsiab lus impurity ntawm Al-Ta alloy

muaj pes tsawg leeg

Cov ntsiab lus(%)

Ta

Fe

Si

C

O

AlTa60

55.0 ~ 65.0

≤ 0.05

≤ 0.02

≤ 0.01

≤ 0.05

AlTa70

65.0 ~ 75.0 hli

≤ 0.05

≤ 0.02

≤ 0.01

≤ 0.05

Cov khoom siv nplua nuj tshwj xeeb tshwj xeeb hauv kev tsim cov Sputtering Lub Hom Phiaj thiab tuaj yeem tsim cov khoom siv Aluminium Tantalum Sputtering raws li cov neeg siv khoom tshwj xeeb. Peb cov khoom muaj cov khoom siv zoo heev, homogeneous qauv, polished nto tsis muaj kev sib cais, pores lossis tawg. Yog xav paub ntxiv, thov hu rau peb.


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