High reputation Al/Nb Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich
High reputation Al/Nb Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:
Titanium Silicon Sputtering Target Description
A super-hard Nitride coating could be formed when Titanium Silicon combined with Nitrogen gas during deposition process. The Silicon element present ensures high oxidation resistance behavior, whiles Titanium – hardness. It could exhibit excellent wear resistance property even at highly elevated temperatures. Cutting tools deposited by TiSiN coating is ideal for high-speed and hard milling, especially in dry cutting, and could deal with some super alloys, like Nickel and Titanium base alloys.
Our typical TiSi targets and their properties
Ti-15Si at% |
Ti-20Si at% |
Ti-25Si at% |
Ti-30Si at% |
|
Purity (%) |
99.9 |
99.9 |
99.9 |
99.9 |
Density(g/cm3) |
4.4 |
4.35 |
4.3 |
4.25 |
Grain Size(µm) |
200/100 |
100 |
100 |
100 |
Process |
VAR/HIP |
HIP |
HIP |
HIP |
Our company has many years of experience of manufacturing sputtering targets for mold cutting tools. Ti-15Si at%, fabricated by vacuum melting, has homogeneous structure, high purity and low gas content. Besides, we also supply Ti-15Si at%、Ti-20Si at% and Ti-25Si at% produced by means of power metallurgy. Our TiSi targets have excellent mechanical properties, making them unsusceptible to cracking and structural failure.
Titanium Silicon Sputtering Target Packaging
Our Titanium Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation.
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RSM’s Titanium Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.
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owing to good service, a variety of high quality products, competitive prices and efficient delivery, we enjoy a good reputation among our customers. We are an energetic company with wide market for High reputation Al/Nb Sputtering Target - Tisi Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich , The product will supply to all over the world, such as: Cape Town, United Arab Emirates, Indonesia, Insisting on the high quality generation line management and customers expert assistance, we now have designed our resolution to offer our buyers using the to start with amount getting and just after services practical experience. Maintaining the prevailing friendly relations with our buyers, we however innovate our solution lists all of the time to satisfy the brand new demands and adhere to the most up-to-date development of the market in Malta. We are ready to face the worries and make the improve to understand all the possibilities in international trade.
By Mario from Israel - 2017.12.31 14:53
Wide range, good quality, reasonable prices and good service, advanced equipment, excellent talents and continuously strengthened technology forces,a nice business partner.
By Miranda from Houston - 2017.02.14 13:19