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High Quality Metal - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich

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"Sincerity, Innovation, Rigorousness, and Efficiency" is the persistent conception of our firm to the long-term to develop together with consumers for mutual reciprocity and mutual advantage for Inconel 600 , Silicon Dioxide Sio2 Pellets , Molybdenum Disilicide Mosi2 Sputtering Target , We will continually strive to improve our service and provide the best quality products with competitive prices. Any inquiry or comment is highly appreciated. Please contact us freely.
High Quality Metal - Crsi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made – Rich Detail:

The fabrication of Chronium Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon and Chronium to obtain step alloys.
2.Powder grinding, packed and evacuation.
3.Hot isostatic pressing treatment to get semi-finished products.
4.Machining the rough chromium-silicon alloy sputtering target material to obtain the chromium-silicon alloy sputtering target material.

CrSi is often used as the high resistance film material, it features the high resistance, stability and low temperature coefficient of resistance. Chronium and Silicon could produce many silicide phases like Cr3Si , Cr5Si3, , CrSi , CrSi2. The production process, composition and Heat treatment process of the CrSi film greatly affects its performance.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Silicon Sputtering Materials according to Customers’ specifications. For more information, please contact us.


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