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High Quality for Ceramic Target 99.99% MOS2 Molybdenum Disulfide Sputtering Targets for Vacuum Coating

Tungsten Copper

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

WCu

Composition

Tungsten Copper

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

PM

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Our growth depends over the superior equipment ,outstanding talents and continuously strengthened technology forces for High Quality for Ceramic Target 99.99% MOS2 Molybdenum Disulfide Sputtering Targets for Vacuum Coating, We generally concertrating on creating new creative item to meet request from our clients everywhere in the world. Be a part of us and let’s make driving safer and funnier alongside one another!
Our growth depends over the superior equipment ,outstanding talents and continuously strengthened technology forces for China MOS2 Target with Copper Backing Plate and High Density Molybdenum Disulfide Target Price, Our company is continuing to serve customers with high quality, competitive price and timely delivery. We sincerely welcome friends from all over the world to cooperate with us and enlarge our business. If you are interested in our items, please feel free to contact us. We would love to offer you with further information.
Tungsten Copper alloy sputtering target is fabricated by means of powder metallurgy. The content of copper ranges mostly between 10% and 50%. It has excellent thermal and electric conductivity, high temperature strength and ductility. At very high temperatures, such as above 3000°C, the copper in the alloy is liquefied and evaporated, absorbing a large amount of heat, and reducing the surface temperature of the material. This kind of material is also called metal sweating material.

Since the two metals of tungsten and copper are incompatible with each other, tungsten-copper alloy has the low expansion, wear resistance, corrosion resistance of tungsten and the high electrical and thermal conductivity of copper, and it is suitable for various mechanical processing. Tungsten-copper alloys can be produced according to user requirements for tungsten-copper ratio production and size processing. Tungsten-copper alloys generally use powder metallurgy processes to prepare powder-batch mixing-press molding-sintering infiltration.

Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Tungsten Copper Sputtering Materials according to Customers’ specifications. For more information, please contact us.Our growth depends over the superior equipment ,outstanding talents and continuously strengthened technology forces for High Quality for Ceramic Target 99.99% MOS2 Molybdenum Disulfide Sputtering Targets for Vacuum Coating, We generally concertrating on creating new creative item to meet request from our clients everywhere in the world. Be a part of us and let’s make driving safer and funnier alongside one another!
High Quality for China MOS2 Target with Copper Backing Plate and High Density Molybdenum Disulfide Target Price, Our company is continuing to serve customers with high quality, competitive price and timely delivery. We sincerely welcome friends from all over the world to cooperate with us and enlarge our business. If you are interested in our items, please feel free to contact us. We would love to offer you with further information.


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