High Quality CrAl Planar Targets for Vacuum Coating in functional films Inexpensive Manufacture
Chromium Aluminum
Innovation, excellent and reliability are the core values of our business. These principles today additional than ever form the basis of our success as an internationally active mid-size firm for High Quality CrAl Planar Targets for Vacuum Coating in functional films Inexpensive Manufacture, Any necessitates from you will be compensated with our greatest consideration!
Innovation, excellent and reliability are the core values of our business. These principles today additional than ever form the basis of our success as an internationally active mid-size firm for China Cral Planar Sputtering Targets and Cral Planar Targets, Adhering to the principle of “Enterprising and Truth-Seeking, Preciseness and Unity”, with technology as the core, our company continues to innovate, dedicated to providing you with the highest cost-effective items and meticulous after-sales service. We firmly believe that: we have been outstanding as we have been specialized.
The fabrication of Chromium Aluminum Sputtering Targets comprises the following steps:
1. Powder grinding and mixing.
2. Hot isostatic pressing treatment to get semi-finished products.
3. Machining the rough chromium aluminum alloy sputtering target material to obtain the chromium aluminum alloy sputtering target material.
During the deposition process of CrAl sputtering targets, a hard Aluminium-Chrom-Nitrid (AlCrN) coating is formed. This coating shows high hardness and oxidation resistance properties even at high temperature. The cutters could run at high feeds to increase productivity and raise quality when using CNC machines.
Our typical AlCr targets and their properties
Cr-70Al at% |
Cr-60Al at% |
Cr-50Al at% |
|
Purity (%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
Density(g/cm3) |
3.7 |
4.35 |
4.55 |
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
Process |
HIP |
HIP |
HIP |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Chronium Aluminum Sputtering Materials, and other CrAl series(for example:CrAlSi,CrAlTi,CrAlZr, CrAlTa,CrAlW,CrAlY,CrAlCe,etc.) according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.
Our typical AlCr targets and their properties
Cr-70Al at% |
Cr-60Al at% |
Cr-50Al at% |
|
Purity (%) |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
99.8/99.9/99.95 |
Density(g/cm3) |
3.7 |
4.35 |
4.55 |
Grain Size(µm) |
100/50 |
100/50 |
100/50 |
Process |
HIP |
HIP |
HIP |
Rich Special Materials specializes in the Manufacture of Sputtering Target and could produce Aluminum Chromium Sputtering Materials according to Customers’ specifications. Our products feature excellent mechanical properties, homogeneous structure, polished surface with no segregation, pores or cracks. For more information, please contact us.Innovation, excellent and reliability are the core values of our business. These principles today additional than ever form the basis of our success as an internationally active mid-size firm for High Quality CrAl Planar Targets for Vacuum Coating in functional films Inexpensive Manufacture, Any necessitates from you will be compensated with our greatest consideration!
High Quality China Cral Planar Sputtering Targets and Cral Planar Targets, Adhering to the principle of “Enterprising and Truth-Seeking, Preciseness and Unity”, with technology as the core, our company continues to innovate, dedicated to providing you with the highest cost-effective items and meticulous after-sales service. We firmly believe that: we have been outstanding as we have been specialized.