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High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine

Chrome Aluminum Silicon

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CrAlSi

Composition

Chrome aluminum silicon

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting,PM

Available Size

L≤1000mm,W≤200mm


Product Detail

Product Tags

We persistently execute our spirit of ”Innovation bringing growth, Highly-quality making sure subsistence, Administration marketing reward, Credit history attracting clients for High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine, Your inquiry will likely be remarkably welcomed in addition to a win-win affluent development are what we’ve been anticipating.
We persistently execute our spirit of ”Innovation bringing growth, Highly-quality making sure subsistence, Administration marketing reward, Credit history attracting clients for China Chrome Target and Hip Chromium Target, During the short years, we serve our clients honestly as Quality First, Integrity Prime, Delivery Timely, which has earned us an outstanding reputation and an impressive client care portfolio. Looking forward to working with you Now!

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We persistently execute our spirit of ”Innovation bringing growth, Highly-quality making sure subsistence, Administration marketing reward, Credit history attracting clients for Cheap price High Purity Chromium Sputtering Target, Cr Sputtering Targets for PVD Coating Machine, Your inquiry will likely be remarkably welcomed in addition to a win-win affluent development are what we’ve been anticipating.
Cheap price China Chrome Target and Hip Chromium Target, During the short years, we serve our clients honestly as Quality First, Integrity Prime, Delivery Timely, which has earned us an outstanding reputation and an impressive client care portfolio. Looking forward to working with you Now!


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