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High Performance PVD Target CuMn Manganese alloy Sputtering Target

Copper Manganese

Short Description:

Category

Alloy Sputtering Target

Chemical Formula

CuMn

Composition

Copper Manganese

Purity

99.9%,99.95%,99.99%

Shape

Plates,Column Targets,arc cathodes,Custom-made

Production Process

Vacuum Melting

Available Size

L≤200mm,W≤200mm


Product Detail

Product Tags

Along with the “Client-Oriented” small business philosophy, a rigorous high-quality handle system, highly developed producing machines and a powerful R&D group, we always supply high-quality products and solutions, fantastic services and aggressive costs for High Performance PVD Target CuMn Manganese alloy Sputtering Target, We give priority to good quality and customer fulfillment and for this we follow stringent excellent control measures. We’ve in-house testing facilities where our goods are tested on each and every aspect at different processing stages. Owning to latest technologies, we facilitate our prospects with custom-made production facility.
Along with the “Client-Oriented” small business philosophy, a rigorous high-quality handle system, highly developed producing machines and a powerful R&D group, we always supply high-quality products and solutions, fantastic services and aggressive costs for China Manganese Sputtering Target and Manganese alloy Target, All the employees in factory, store, and office are struggling for one common goal to provide better quality and service. Real business is to get win-win situation. We would like to provide more support for customers. Welcome all nice buyers to communicate details of our products with us!
Copper Manganese alloy sputtering target is fabricated by means of vacuum melting. It has homogenous microstructure, high hardness and anti-deformation properties, and long service life. So it could help to reduce manufacturing costs because it is unnecessary to replace the sputter targets at frequent intervals.

Copper Manganese alloy could also be used to produce Manganese brass and Cu-Ni-Mn Alloys. Manganese shows substantial solid solubility in copper and is an effective solid solution strengthening agent. It could noticeably improve the hardness and strength, and corrosion resistance behavior in marine, chloride medium and vapor pressure.

Copper is a chemical element originated from the Old English name coper, which in turn derived from the Latin ‘Cyprium aes’, meaning a metal from Cyprus. It was early used in 9000 BC and discovered by people from the Middle East. “Cu” is the canonical chemical symbol of copper. Its atomic number in the periodic table of elements is 29 with location at Period 4 and Group 11, belonging to the d-block. The relative atomic mass of copper is 63.546(3) Dalton, the number in the brackets indicating the uncertainty.

Manganese is a chemical element originated from Either the Latin ‘magnes’, meaning magnet or from the black magnesium oxide, ‘magnesia nigra’. It was first mentioned in 1770 and observed by O. Bergman. The isolation was later accomplished and announced by G. Gahn. “Mn” is the canonical chemical symbol of manganese. Its atomic number in the periodic table of elements is 25 with location at Period 4 and Group 7, belonging to the d-block. The relative atomic mass of manganese is 54.938045(5) Dalton, the number in the brackets indicating the uncertainty.

A wide range of special materials specialising in the manufacture of sputtering targets, we can produce copper and manganese sputtering materials to customer specifications. For more information, please contact us.Along with the “Client-Oriented” small business philosophy, a rigorous high-quality handle system, highly developed producing machines and a powerful R&D group, we always supply high-quality products and solutions, fantastic services and aggressive costs for High Performance PVD Target CuMn Manganese alloy Sputtering Target, We give priority to good quality and customer fulfillment and for this we follow stringent excellent control measures. We’ve in-house testing facilities where our goods are tested on each and every aspect at different processing stages. Owning to latest technologies, we facilitate our prospects with custom-made production facility.
High Performance China Manganese Sputtering Target and Manganese alloy Target, All the employees in factory, store, and office are struggling for one common goal to provide better quality and service. Real business is to get win-win situation. We would like to provide more support for customers. Welcome all nice buyers to communicate details of our products with us!


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