High definition China High Quality Nickel Chrome Sputtering Target (ni 80% Cr 20%, wt%)

We pursue the administration tenet of “Quality is top-quality, Company is supreme, Track record is first”, and will sincerely create and share success with all purchasers for High definition China High Quality Nickel Chrome Sputtering Target (ni 80% Cr 20%, wt%), Welcome all nice customers communicate details of products and solutions and ideas with us!!
We pursue the administration tenet of “Quality is top-quality, Company is supreme, Track record is first”, and will sincerely create and share success with all purchasers for China Sputtering Target, Nickel, Our company is an international supplier on this kind of merchandise. We offer you an amazing selection of high-quality items. Our goal is to delight you with our distinctive collection of mindful products while providing value and excellent service. Our mission is simple: To deliver the best products and solutions and service to our customers at the lowest prices possible.

Chronium Aluminum Silicon Sputtering Target Description

The fabrication of Chronium Aluminum Silicon Sputtering Targets comprises the following steps:
1.Vacuum melting of Silicon, Aluminum and Chronium to obtain step alloys.
2.Powder grinding and mixing.
3.Hot isostatic pressing treatment to obtain the chromium Aluminum silicon alloy sputtering target.
Chronium Aluminum Silicon Sputtering Targets are extensively used in cutting tools and molds, owing to its wear resistance and high temperature oxidation resistance to improve the film performance.
An amorphous Si3N4 phase would be formed during the process of PVD of CrAlSi targets. Due to the incorporation of amorphous Si3N4 phase, the growth of the grain size could be restrained and improve the high temperature oxidation resistance property.

Chronium Aluminum Silicon Sputtering Target Packaging

Our Chronium Aluminum Silicon sputter target is clearly tagged and labeled externally to ensure efficient identification and quality control. Great care is taken to avoid any damage which might be caused during storage or transportation

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RSM’s Chronium Aluminum Silicon sputtering targets are of ultra-high purity and uniform. They are available in various forms, purities, sizes, and prices. We specialize in producing high purity thin film coating materials with excellent performance as well as the highest possible density and smallest possible average grain sizes for use in mold coating、decoration、automobile parts、low-E glass、semi-conductor integrated circuit、thin film resistance、graphic display、aerospace、 magnetic recording、touch screen、thin film solar battery and other physical vapor deposition (PVD) applications. Please send us an inquiry for current pricing on sputtering targets and other deposition materials not listed.We pursue the administration tenet of “Quality is top-quality, Company is supreme, Track record is first”, and will sincerely create and share success with all purchasers for High definition China High Quality Nickel Chrome Sputtering Target (ni 80% Cr 20%, wt%), Welcome all nice customers communicate details of products and solutions and ideas with us!!
High definition China Sputtering Target, Nickel, Our company is an international supplier on this kind of merchandise. We offer you an amazing selection of high-quality items. Our goal is to delight you with our distinctive collection of mindful products while providing value and excellent service. Our mission is simple: To deliver the best products and solutions and service to our customers at the lowest prices possible.