WNiCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO ka mea Tungsten Nickel Copper kahi mea hoʻohui Tungsten-based me 85-99% Tungsten content a me Nickel, Copper, Molybdenum a me Chronium i hoʻohui ʻia i loko. Loaʻa iā ia nā waiwai machining maikaʻi, ka wela a me ka conductivity uila, non-magnetic, maikaʻi loa ka pale ʻana i ka radiation, haʻahaʻa haʻahaʻa hoʻonui coefficient, ka mea i hoʻohana nui ʻia i ka pale radiation me ka ʻona koʻikoʻi. No ka koi 'ole-magnetic gyrostatic rotor mea, a counterweight a cushioning mea ma luna o ka mokulele, i loko o ka pūʻali koa papahana, e hoʻohana 'ia e like me ka pale kaua pana a me ka shrapnel etc., e hoʻohana 'ia e like me ka X-ray-pale pale mea i loko o ka 'oihana lapaʻau, ka mea kiʻekiʻe. -density alloy oscillator, ka uila hoʻonāukiuki i hoʻohana ʻia e like me ka ʻoihana kīwila ma ka ʻāpana kelepona kelepona a me nā mea electrode etc.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Tungsten Nickel Copper Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.