WCU Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Hoʻokumu ʻia ʻo Tungsten Copper alloy sputtering target e ka pauka metallurgy. ʻO ka nui o ke keleawe ma waena o 10% a me 50%. He maikaʻi ka wela a me ka uila conductivity, kiʻekiʻe wela ikaika a me ka ductility. Ma nā wela kiʻekiʻe loa, e like me ma luna o 3000 ° C, ua hoʻoheheʻe ʻia ke keleawe i loko o ka mea hoʻoheheʻe ʻia a hoʻoheheʻe ʻia, e hoʻomoʻi i ka nui o ka wela, a hoʻemi i ka mahana o ka ʻili o ka mea. ʻO kēia ʻano mea i kapa ʻia he mea hoʻoheheʻe metala.

No ka mea ʻaʻole kūlike nā metala ʻelua o ka tungsten a me ke keleawe, ʻo ka tungsten-copper alloy ka haʻahaʻa haʻahaʻa, ke kūpaʻa ʻana, ke kūpaʻa ʻana o ka tungsten a me ke kiʻekiʻe uila a me ka thermal conductivity o ke keleawe, a ua kūpono ia no nā ʻano hana mechanical. Hiki ke hana ʻia nā ʻāpana tungsten-copper e like me nā koi o ka mea hoʻohana no ka hana ʻana o ka ratio tungsten-copper a me ka hana ʻana i ka nui. Hoʻohana maʻamau ʻo Tungsten-copper alloys i nā kaʻina hana metallurgy pauka no ka hoʻomākaukau ʻana i ka pauka-batch mixing-press molding-sintering infiltration.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Tungsten Copper Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.