V Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Vanadium
ʻO ka wehewehe ʻana o ka Vanadium Sputtering
ʻO ka Vanadium he metala paʻakikī, ductile me kahi hiʻohiʻona hina-hinahina. ʻOi aku ka paʻakikī ma mua o ka hapa nui o nā metala a hōʻike i ke kūpaʻa ʻino maikaʻi i nā alkalis a me nā waikawa. ʻO kona helu heheʻe he 1890 ℃, a he 3380 ℃ ka paila hoʻolapalapa. ʻO kona helu ʻātoma he 23, a ʻo ke kaumaha ʻātoma he 50.9414. Loaʻa iā ia kahi hoʻolālā cubic i waena o ka maka a me nā mokuʻāina oxidation i loko o kāna mau pūhui o +5, +4, +3 a me +2. He kiʻekiʻe ka helu heheʻe, ductility, paakiki, a me ka corrosion kū'ē.
Hoʻohana nui ʻia ʻo Vanadium i kekahi mau ʻoihana a me nā noi, e like me nā ʻenekini jet, nā kiʻekiʻe kiʻekiʻe o ka ea ea, nuklea reactors a me ka alloying o ke kila.
He mea koʻikoʻi ʻo Vanadium sputtering target no nā cell solar a me nā uhi lens optical.
Nānā Kemimi
Maemae | 99.7 | 99.9 | 99.95 | 99.99 |
Fe | ≤0.1 | ≤0.05 | ≤0.02 | ≤0.01 |
Al | ≤0.2 | ≤0.05 | ≤0.03 | ≤0.01 |
Si | ≤0.15 | ≤0.1 | ≤0.05 | ≤0.01 |
C | ≤0.03 | ≤0.02 | ≤0.01 | ≤0.01 |
N | ≤0.01 | ≤0.01 | ≤0.01 | ≤0.01 |
O | ≤0.05 | ≤0.05 | ≤0.05 | ≤0.03 |
Ka haumia i ka huina | ≤0.3 | ≤0.1 | ≤0.05 | ≤0.01 |
Vanadium Sputtering Target Packaging
Hoʻopili ʻia kā mākou Vanadium sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.
Loaʻa i ka Hoʻokaʻaʻike
Hāʻawi nā pahuhopu vanadium sputtering o RSM i ka maʻemaʻe maikaʻi loa a me ka kūlike. Loaʻa iā lākou ma nāʻano likeʻole, ka maʻemaʻe, ka nui a me nā kumukūʻai. Hoʻomaʻamaʻa mākou i ka maʻemaʻe kiʻekiʻe kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni me nā waiwai maikaʻi loa, a me ka mea kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi loa o ka nui o ka palaoa, no ka uhi ʻana i ka make, nā mea hoʻonaninani, nā ʻāpana automotive, nā aniani E haʻahaʻa, nā ʻāpana hui semiconductor, nā pale kiʻi ʻoniʻoni lahilahi, nā hōʻike kiʻi. , Aerospace, leo hoʻopaʻa magnetic, nā pale paʻi, nā kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni a me nā noi ʻē aʻe o ka hoʻoheheʻe kino kino (PVD). E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no ke kumu kūʻai o kēia manawa no ka sputtering targets a me nā mea waiho ʻē aʻe ʻaʻole i helu ʻia.