Nā ʻāpana Silicid Tungsten

Hoʻohana ʻia ʻo Tungsten silicide WSi2 ma ke ʻano he mea hoʻoheheʻe uila i ka microelectronics, shunting ma luna o nā uea polysilicon, anti-oxidation coating a me ka pale uea pale. Hoʻohana ʻia ʻo Tungsten silicide ma ke ʻano he mea pili i ka microelectronics, me ka resistivity o 60-80μΩcm. Hoʻokumu ʻia ia ma 1000 ° C. Hoʻohana maʻamau ia ma ke ʻano he shunt no nā laina polysilicon e hoʻonui i kona conductivity a hoʻonui i ka wikiwiki o ka hōʻailona. Hiki ke hoʻomākaukau ʻia ka papa tungsten Silicide e ka hoʻoheheʻe ʻana i ka mahu, e like me ka deposition vapor. E hoʻohana i ka monosilane a i ʻole dichlorosilane a me tungsten hexafluoride e like me ke kinoea maka. ʻAʻole stoichiometric ka kiʻiʻoniʻoni i waiho ʻia a koi ʻia ka annealing e hoʻololi ʻia i kahi ʻano stoichiometric conductive.

Hiki i ka tungsten silicide ke pani i ke kiʻi tungsten mua. Hoʻohana ʻia ʻo Tungsten silicide ma ke ʻano he pale pale ma waena o ke silika a me nā metala ʻē aʻe.

He waiwai nui nō hoʻi ka silicide Tungsten i nā ʻōnaehana microelectromechanical, ma waena o ka tungsten silicide i hoʻohana nui ʻia ma ke ʻano he kiʻi ʻoniʻoni no ka hana ʻana i nā microcircuits. No kēia kumu, hiki ke hoʻopaʻa ʻia ke kiʻiʻoniʻoni tungsten silicide me ka hoʻohana ʻana, no ka laʻana, silicide.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Tungsten Silicideʻāpanae like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.