Wholesale TiAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Manufacturer and Supplier

Titanium Aluminum Silika

TiAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

ʻO ka wehewehe pōkole:

Māhele	Alloy Sputtering Target
ʻO ke kimekema	TiAlSi
Huina	ʻO Titanium Aluminum Silika
Maemae	99.5%，99.9%，99.95%
Kinohi	ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Kaʻina Hana Hana	PM
Nui Loaʻa	L≤2000mm,W≤200mm

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

ʻO Titanium Aluminum Silicon Sputtering Target Description

ʻO Titanium Aluminum Silicon sputtering target i hana ʻia e ka mana metallurgy.
ʻO Titanium Aluminum Silicon alloy i hoʻohana maʻamau i ka hana ʻana i nā mīkini kaʻa. Loaʻa iā ia ke kūpono kiʻekiʻe kiʻekiʻe a me ke kūpaʻa ʻaʻahu. Hiki i ka hoʻohana ʻana o Ti-Al-Si alloy ke hoʻolōʻihi i ke ola o nā ʻenekini ma kahi o 35%. No kāna noi ʻana i ka huila kaʻa a me ka huila kaʻa, hōʻike ʻo ia i ka maikaʻi o ka castability, machinability, ka luhi luhi a me ka paʻakikī o ka hopena ma mua o A356 Aluminum.

Hiki ke kiʻi ʻia kahi alumini alumini paʻa paʻa wikiwiki ʻia e kahi kaʻina hana paʻa paʻa i kapa ʻia ʻo "melt spinning", kahi e hoʻohua ai i nā waiwai ʻoi aku ka maikaʻi i ka hoʻohālikelike ʻia me ka alumini alumini maʻamau, me ka microstructure fine-grained a ʻoi aku ka maʻalahi o ka alloying. He mea kūpono ia i ka ʻoihana mokulele e hoʻololi i ka alloy base Titanium i hoʻohana ʻia ma 150-300 ℃.

I loko o ke kaʻina hana deposition o nā pahuhopu TiAlSi, hiki ke hoʻokumu ʻia ʻo TiAlSi/TiAlSiN ma ke ʻano he multi-layer o nā papa crystalline kiʻekiʻe me ka nui o nā hale cubic. Ua hana kēia mau mea hoʻoheheʻe multi-layer i kēia mau mea no nā pale paʻakikī e hoʻonui i ke ola o nā mea kani i hoʻohana ʻia no nā kaiapuni paʻakikī.

ʻO Titanium Aluminum Silicon Sputtering Target Packaging

ʻO kā mākou Titanium Aluminum Silicon sputter target ua hōʻailona maopopo ʻia a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.

Loaʻa i ka Hoʻokaʻaʻike

ʻO ka RSM's Titanium Aluminum Silicon sputtering targets he ultra-high clean and uniform. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai. Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.

Mua: TiAlV Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Aʻe: TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made