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Aluminum Titanium

TiAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made Featured Image

ʻO ka wehewehe pōkole:

Māhele	Alloy Sputtering Target
ʻO ke kimekema	TiAl
Huina	Aluminum Titanium
Maemae	99.9%，99.95%，99.99%
Kinohi	ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Kaʻina Hana Hana	ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM
Nui Loaʻa	L≤2000mm,W≤200mm

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

wikiō

ʻO ka wehewehe ʻana o ka Titanium Aluminum Sputtering Target

ʻOi aku ka kiʻekiʻe o ke koi o ka maikaʻi i manaʻo ʻia no ka uhi ʻana i ka sputter ma mua o ka ʻoihana maʻamau. Hoʻopili pololei ka microstructure like ʻole o ka pahuhopu i ka hana sputtering. Loaʻa iā mākou kahi ʻōnaehana hoʻokele maikaʻi a koho mākou i nā mea maka maʻemaʻe kiʻekiʻe a hoʻohui pono iā lākou e hōʻoia i ka homogeneity. Hoʻopuka ʻia ka pahu pahu pahu pahu Titanium Aluminum alloy ma o ke ʻano o ka kaomi wela wela.

Hiki i kā mākou Titanium Aluminum sputtering targets ke hāʻawi i kahi uhi nitride kūpaʻa kūʻokoʻa, Titanium aluminum nitride (TiAlN). ʻO TiAlN ka mea nui i kēia manawa ma ke ʻano he kiʻiʻoniʻoni no ka ʻoki ʻana i nā mea hana, nā ʻāpana sliding a me nā ʻāpana tribo. Loaʻa iā ia ka paʻakikī kiʻekiʻe, ka paʻakikī, ka hana kūʻokoʻa a me ka mahana oxidation.

ʻO kā mākou mau pahuhopu TiAl maʻamau a me kā lākou mau waiwai

	Ti-75Al ma%	Ti-70Al ma%	Ti-67Al ma%	Ti-60Al ma%	Ti-50Al ma%	Ti-30Al ma%	Ti-20Al ma%	Ti-14Al ma%
Maʻemaʻe (%)	99.7	99.7	99.7	99.7	99.8/99.9	99.9	99.9	99.9
ʻO ka mānoanoa（g/cm³）	3.1	3.2	3.3	3.4	3.63/3.85	3.97	4.25	4.3
Gua Nui(µm)	100	100	100	100	100/-	-	-	-
Kaʻina hana	HIP	HIP	HIP	HIP	HIP/VAR	VAR	VAR	VAR

Titanium Aluminum Sputtering Target Packaging

Hoʻopili ʻia kā mākou Titanium Aluminum sputter target ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.

Loaʻa i ka Hoʻokaʻaʻike

ʻO nā pahu hoʻoheheʻe Titanium Aluminum o RSM he maʻemaʻe kiʻekiʻe loa a me ka lole. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.
Hiki iā mākou ke hāʻawi i nā ʻano geometric like ʻole: nā paipu, nā cathodes arc, planar a i hana maʻamau, a me ka laulā ākea o ka Aluminum. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, microstructure homogeneous, ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores, a me nā māwae.
Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.