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NiTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Tantalum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

NiTa

Huina

Nickel tantalum

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM

Nui Loaʻa

L≤200mm, W≤200mm


Huahana Huahana

Huahana Huahana

Hana ʻia ʻo Nickel Tantalum Sputtering Targets ma ke ʻano o ka hoʻoheheʻe ʻana a i ʻole ka pauka metallurgical. Loaʻa iā ia ka maʻemaʻe kiʻekiʻe a me ka microstructure homogeneous.

Hoʻohana nui ʻia ʻo Nickel Tantalum Sputtering Targets i ka aerospace, nā mokulele, nā ʻoihana hoʻokele. ʻO kona kūpaʻa maikaʻi i ka hoʻoulu ʻana o ka ʻili kiʻekiʻe e loaʻa mai ka nui o ka Tantalum i loaʻa i loko o ka alloy, nona ka wela hoʻoheheʻe kiʻekiʻe o 3000 ° C. Hoʻohui pinepine ʻia ka Aluminum, Yttrium a me Chronium i mea e hoʻomaikaʻi ai i nā waiwai.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Nickel Tantalum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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