Welina mai i kā mākou mau pūnaewele!

NiCrCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Chromium Copper

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

NiCrCu

Huina

Ke keleawe nickel chromium

Maemae

99.5%,99.7%,99.9%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤2000mm,W≤350mm


Huahana Huahana

Huahana Huahana

Hana ʻia ka pahuhopu Sputtering NiCrCu e ka Melting and Casting o nā mea maka o Nickel Chromium Copper. He kiʻekiʻe resistivity, haʻahaʻa wela coefficient a kiʻekiʻe sensitivity. Loaʻa i ka Nickel a me Chromium ka ikehu ʻili like, a ʻo ka haku mele ʻana o NiCrCu thin-film deposition e like me ka sputtering target, no laila e maʻalahi ke hoʻomalu i ka hopena deposition.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hana ʻo Nickel Chromium Copper Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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