Welina mai i kā mākou mau pūnaewele!

NiCrAlSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Nickel Chromium Aluminum Silicon

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

NiCrAlSi

Huina

Nickel Chromium Aluminum Silicon

Maemae

99.5%,99.9%,99.95%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤1500mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hoʻokumu ʻia ka pahuhopu Sputtering NiCrAlSi e Vacuum Melting, Casting and Hot Treatment e hōʻoia i ka paʻa kiʻekiʻe, ka nui o ka palaoa a me ka hana maikaʻi.

Ma muli o kona kūpaʻa kiʻekiʻe kiʻekiʻe, ke ʻano anti-corrosion maikaʻi, ke kūpaʻa wela kiʻekiʻe a me ka solderability, Nickel Chromium Aluminum Silicon alloy ua hoʻohana nui ʻia i nā noi ʻoihana he nui, me ka Metallurgy, Mechanical manufacturing, a me nā mea hale.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hoʻoheheʻe Nickel Chromium Aluminum Silicon Sputtering e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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