AlNi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Hoʻopuka ʻia ka pahu hoʻoheheʻe ʻana o ka pahu pahu pahu alumini alumini ma o ka hoʻoheheʻe ʻana i ka ʻūhā a me ka metallurgy mana. ʻO ka hui ʻana i ka alumini a me ka nikela i kahi nui e pono ai e hoʻolako i ka ingot hoʻolei AlNi. ʻOki ʻia ka ingot hoʻolei e hana i ke ʻano i makemake ʻia. Loaʻa iā ia ke kūlike kiʻekiʻe, ka nui o ka palaoa i hoʻomaʻemaʻe ʻia a me ka microstructure homogeneous, me ka ʻole o ke kinoea puff a i ʻole pores.

Ma muli o kāna hui maikaʻi ʻana o ka uhi a me nā mea substrate, ʻoi aku ka maikaʻi o ka uhi ʻana o AlNi ma lalo o 700 ℃. I kēia manawa, hoʻohana nui ʻia ka AlNi sputtering target i nā lole pale pale, me ka ʻoki ʻana i nā mea hana, nā ʻōpala, nā ʻoihana kaʻa a me nā hana kūkulu.

ʻO nā mea waiwai kūikawā he mea hana ia o ka Sputtering Target a hiki ke hana i nā lako alumini nikel sputtering e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.