ʻO ka Magnetron sputtering coating kahi ʻano hoʻoheheʻe kino kino hou, ke hoʻohālikelike ʻia me ke ʻano o ka uhi ʻana o ka evaporation ma mua, ʻo kona mau mea maikaʻi i nā ʻano he mea kupaianaha loa. Ma ke ʻano he ʻenehana makua, ua hoʻohana ʻia ka magnetron sputtering ma nā ʻano he nui.
ʻO ke kumu hoʻoheheʻe Magnetron:
Hoʻohui ʻia kahi māla magnetic orthogonal a me ka māla uila ma waena o ka pole target sputtered (cathode) a me ka anode, a ua hoʻopiha ʻia ke kinoea inert e koi ʻia (maʻamau Ar kinoea) i loko o ke keʻena maloʻo kiʻekiʻe. Hoʻokumu ka magnet paʻa i kahi māla magnetic 250-350 gaus ma ka ʻili o ka mea i manaʻo ʻia, a ua haku ʻia ke kahua electromagnetic orthogonal me ke kahua uila uila kiʻekiʻe. Ma lalo o ka hopena o ka uila, Ar kinoea ionization i loko o ka maikaʻi iions a me nā electrons, pahu hopu a loaʻa i kekahi puʻe maikaʻi ʻole, mai ka pahu hopu mai ka pole e ka hopena o ka mākia a me ka hoʻonui ʻana i ke kinoea hana ionization, hana i kahi plasma kiʻekiʻe kokoke i ka cathode, Ar ion ma lalo o ka hana a ka lorentz ikaika, e holo wikiwiki i ka lele i ka ili i hoʻopaʻa ʻia, e hoʻopā i ka ʻili maka i ka wikiwiki kiʻekiʻe. me ka ikehu kinetic kiʻekiʻe i ka substrate deposition film.
Hoʻokaʻawale ʻia ʻo Magnetron sputtering i ʻelua ʻano: DC sputtering a me RF sputtering. He mea maʻalahi ke kumumanaʻo o nā mea hoʻoheheʻe DC, a wikiwiki ka wikiwiki i ka wā e hoʻoheheʻe ai i ka metala. ʻOi aku ka nui o ka hoʻohana ʻana i ka RF sputtering, ma waho aʻe o ka sputtering conductive material, akā hoʻi i ka sputtering non-conductive material, akā pū kekahi reactive sputtering hoʻomākaukau o nā oxides, nitrides a me ka carbide a me nā mea hoʻohui ʻē aʻe. Inā piʻi ka alapine o RF, lilo ia i ka microwave plasma sputtering. I kēia manawa, hoʻohana mau ʻia ka ʻano microwawe plasma sputtering electron cyclotron resonance (ECR).
ʻO ka mea i hoʻopaʻa ʻia e ka Magnetron sputtering coating:
Mea hoʻoheheʻe ʻia metala, ka uhi ʻana i nā mea hoʻoheheʻe ʻana i ka mea hoʻoheheʻe ʻia, ka mea hoʻoheheʻe ʻia ʻana o nā mea i hoʻopaʻa ʻia. silicide ceramic sputtering mea pahuhopu, sulfide mea hoʻoheheʻe ʻia nā mea i manaʻo ʻia, Telluride ceramic sputtering pahu, nā pahu pahu ʻē aʻe, chromium-doped silicon oxide ceramic target (CR-SiO), indium phosphide target (InP), lead arsenide target (PbAs), indium arsenide target (InAs).
Ka manawa hoʻouna: ʻAukake-03-2022