He aha nā ʻano o ka Magnetron Sputtering Target

I kēia manawa, ʻoi aku ka nui o nā mea hoʻohana e hoʻomaopopo i ke ʻano o nā pahuhopu akona mau noi, aka, aole maopopo loa ka mahele ana. Ano eʻenekinia RSM kaʻana like me ʻoekekahi induction o ka magnetron sputtering pahu hopu.

Pahu hoʻoheheʻe: pahu pahu hoʻoheheʻe metala, pahu pahu pahu pahu hao, pahu pahu pahu pahu pahu, pahu pahu pahu boride, pahu pahu pahu carbide, pahu pahu pahu fluoride, pahu pahu nitride ceramic, pahu pahu ceramic, selenide ceramic sputtering target, silide ceramic sputtering pahu hopu, sulfide ka pahu pahu pahu, telluride ceramic sputtering target, nā pahu pahu ʻē aʻe, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).

Hoʻokaʻawale ʻia ʻo Magnetron sputtering i ʻelua ʻano: DC sputtering a me RF sputtering. He maʻalahi ke kumumanaʻo o nā mea hoʻoheheʻe DC, a wikiwiki hoʻi kona wikiwiki i ka wā e hoʻoheheʻe ai i ka metala. Hoʻohana nui ʻia ka RF sputtering. Ma waho aʻe o ka sputtering data conductive, hiki iā ia ke sputter non-conductive data. Hiki ke hoʻohana ʻia ka pahuhopu sputtering no ka sputtering reactive e hoʻomākaukau i ka ʻikepili hui e like me nā oxides, nitrides a me nā carbide. Inā piʻi ka alapine RF, e lilo ia i ka microwave plasma sputtering. I kēia manawa, hoʻohana maʻamau ka electron cyclotron resonance (ECR) microwave plasma sputtering.