He aha nā hiʻohiʻona a me nā loina ʻenehana o ka mea i hoʻopaʻa ʻia i ka uhi

ʻO ke kiʻi ʻoniʻoni ma luna o ka pahu i uhi ʻia he ʻano mea kūikawā. Ma ke kuhikuhi kiko'ī o ka mānoanoa, liʻiliʻi loa ka pālākiō, ʻo ia ka nui o ka microscopic ana. Eia kekahi, ma muli o ke ʻano a me ke ʻano o ka mānoanoa o ke kiʻiʻoniʻoni, hoʻopau ka hoʻomau ʻana o nā mea, ka mea e hana ai i ka ʻikepili kiʻiʻoniʻoni a me ka ʻikepili i loaʻa i nā waiwai maʻamau. ke kumu a me nā mākau o ka sputtering coating.

　　一、Principle of sputtering coating

Sputtering coating akamai ka hoʻohana ʻana i ka ion shelling target hiʻohiʻona, nā ʻātoma i kuʻi ʻia i waho o ka hanana i kapa ʻia ʻo sputtering. Ua kapa ʻia nā ʻātoma i waiho ʻia ma ka ʻili o ka substrate. cathode pahu hopu, a lele i ka ili o ka substrate e waiho i loko o ka film.Simply olelo, sputtering uhi hoʻohana haʻahaʻa puʻe inert kinoea glow hoʻokuʻu e hoʻohua i nā ion.

ʻO ka maʻamau, ua hoʻolako ʻia nā mea hoʻonaninani kiʻiʻoniʻoni sputtering me nā electrodes ʻelua i loko o kahi keʻena hoʻokuʻu māmā, a ʻo ka pahuhopu cathode i haku ʻia i ka ʻikepili uhi. Hoʻopiha ʻia ke keʻena ʻeleu me ke kinoea argon me ke kaomi o 0.1 ~ 10Pa. Hoʻokuʻu ʻia ka glow ma ka cathode ma lalo o ka hana o ka uila kiʻekiʻe maikaʻi ʻole o 1 ~ 3kV dc a i ʻole rf voltage o 13.56mhz.Argon iions bombard the target surface and cause the sputtered target atoms to accumulate on the substrate.

　　二、Sputtering coating mau hiʻohiʻona

1, ʻO ka wikiwiki hoʻopaʻa ʻana

ʻO ka ʻokoʻa ma waena o ke kiʻekiʻe kiʻekiʻe magnetron sputtering electrode a me nā kuʻuna ʻelua pae sputtering electrode, ʻo ia ka mea i hoʻonohonoho ʻia ka magnet ma lalo o ka pahu hopu, no laila ke kū nei ke kahua paʻa ʻole ma ka ʻili o ka pahu. o ke kahua magnetic heterogeneous. Ma muli o ka hopena o ka nānā ʻana, ua emi iki nā electrons. Ka heterogeneous magnetic field hele a puni ka ili i hoʻopaʻa 'ia, a me ka lua electrons i hopuia i loko o ka heterogeneous magnetic field collide me ke kinoea molekele pinepine, e hoʻomaikaʻi i ka kiʻekiʻe huli ana o na kinoea molecules. hiki ke loaʻa i ka maikaʻi o ka uhi ʻana, me nā hiʻohiʻona hoʻokuʻu kūpono.

2、He haʻahaʻa ka mahana substrate

Kiʻekiʻe kiʻekiʻe magnetron sputtering, i ʻike ʻia he haʻahaʻa wela sputtering. ʻO ke kumu ke hoʻohana nei ka mea hana i nā hoʻokuʻu i kahi ākea o nā māla electromagnetic i pololei i kekahi i kekahi. ʻO nā electrons lua e kū ana ma waho o ka pahuhopu, i loko o kekahi. Ma lalo o ka hana o ke kahua electromagnetic pololei, ua hoʻopaʻa ʻia ia ma kahi kokoke i ka ʻili o ka pahuhopu a neʻe ma ke ala holo i loko o kahi laina ʻōwili pōʻai, e kīkē pinepine ana i nā molekele kinoea e hoʻokaʻawale i nā mole kinoea. mau puʻupuʻu, a hiki i ka pau ʻana o ko lākou ikehu ma mua o ka hiki ʻana iā lākou ke pakele mai ka ʻili o ka pahu hopu kokoke i ka substrate. No ka haʻahaʻa loa o ka ikehu o nā electrons, ʻaʻole piʻi kiʻekiʻe ka mahana o ka pahu hopu. Ua lawa ia no ka pale ʻana i ka piʻi ʻana o ka wela o ka substrate ma muli o ka puhi ʻana i ka electron kiʻekiʻe o kahi pana diode maʻamau, e hoʻopau ai i ka cryogenization.

3、He ākea ākea o nā hale membrane

ʻOkoʻa loa ke ʻano o nā kiʻiʻoniʻoni lahilahi i loaʻa ma ka hoʻoheheʻe ʻana a me ka waiho ʻana o ka injection mai ka mea i loaʻa ma ka ʻili ʻana i nā mea paʻa. He ʻokoʻa i nā mea paʻa maʻamau, i hoʻokaʻawale ʻia ma ke ʻano he ʻano like ʻole i loko o ʻekolu anana, ua hoʻokaʻawale ʻia nā kiʻiʻoniʻoni i waiho ʻia i loko o ka māhele kinoea ma ke ʻano he heterogeneous structures. ʻO ka ulu ʻana o ke kolamu o ke kiʻiʻoniʻoni ma muli o ka ʻili convex mua o ka substrate a me kekahi mau aka i nā ʻāpana koʻikoʻi o ka substrate. Eia naʻe, ʻokoʻa ke ʻano a me ka nui o ke kolamu ma muli o ka wela o ka substrate, ka hoʻopuehu ʻana o ka ʻili o nā ʻātoma i hoʻopaʻa ʻia, ke kanu ʻana o nā ʻātoma haumia a me ka hanana ʻana o nā ʻātoma i hana ʻia e pili ana i ka ʻili substrate. I ka nui o ka wela wela, loaʻa i ke kiʻi ʻoniʻoni kahi ʻano fibrous, kiʻekiʻe kiʻekiʻe, i haku ʻia me nā kristal kolamu maikaʻi, ʻo ia ke ʻano kūʻokoʻa o ke kiʻi sputtering.

ʻO ke kaomi sputtering a me ka wikiwiki hoʻopaʻa kiʻiʻoniʻoni e pili pū i ke ʻano o ke kiʻiʻoniʻoni. No ka mea, loaʻa i nā molekele kinoea ka hopena o ka hoʻopau ʻana i ka hoʻopuehu ʻana o nā mana ma ka ʻili o ka substrate, kūpono ka hopena o ke kaomi sputtering kiʻekiʻe no ka hāʻule ʻana o ka mahana o ka substrate i ke kumu hoʻohālike. No laila, hiki ke kiʻi ʻia nā kiʻiʻoniʻoni porous i loaʻa i nā kīʻaha maikaʻi ma ke kaomi sputtering kiʻekiʻe. ʻO kēia kiʻi liʻiliʻi liʻiliʻi liʻiliʻi he kūpono no ka lubrication, ke kūpaʻa ʻana, ka paʻakikī o ka ʻili a me nā noi mechanical ʻē aʻe.

4、E hoʻonohonoho like i ka haku mele

ʻO nā pūhui, hui pū ʻia, nā ʻāpana, a me nā mea ʻē aʻe, he mea paʻakikī loa ke uhi ʻia e ka evaporation vacuum no ka mea ʻokoʻa nā kaomi mahu o nā ʻāpana a no ka mea ʻokoʻa lākou i ka wā wela. i ka substrate, ma kēia ʻano he ʻoi aku ka maikaʻi o ka hana kiʻiʻoniʻoni. Hiki ke hoʻohana ʻia nā ʻano mea like ʻole i ka hana ʻana i ka uhi ʻana ma o ka sputtering.