Nā ʻano o ka Magnetron Sputtering Target

Me ka piʻi ʻana o ka noi mākeke, ʻoi aku ka nui o nā ʻano sputtering target e hoʻonui mau ʻia. Ua kamaʻāina kekahi a ʻike ʻole kekahi i nā mea kūʻai aku. I kēia manawa, makemake mākou e kaʻana like me ʻoe i ke ʻano o nā pahu hoʻoheheʻe magnetron.

Loaʻa i nā ʻano ʻano like ʻole ka pahu pahu pahu: pahu pahu pahu pahu hao, pahu pahu pahu pahu hao, pahu pahu pahu pahu pahu, pahu pahu pahu boride, pahu pahu pahu carbide, pahu pahu fluoride ceramic, pahu pahu pahu nitride ceramic, pahu pahu selenide ceramic. , ka pahu hopu silicide ceramic sputtering, sulfide ceramic sputtering pahu hopu, telluride ceramic sputtering pahu hopu, nā pahu hopu ʻē aʻe, Chromium doped silicon oxide ceramic target (CR SiO), indium phosphide target (INP), lead arsenide target (pbas), indium arsenide target (InAs).

Hoʻokaʻawale ʻia ʻo Magnetron sputtering i ʻelua ʻano: DC sputtering a me RF sputtering. He maʻalahi ke kumumanaʻo o nā mea hoʻoheheʻe DC, a wikiwiki hoʻi kona wikiwiki i ka wā e hoʻoheheʻe ai i ka metala. Hoʻohana nui ʻia ka RF sputtering. Ma waho aʻe o ka sputtering data conductive, hiki iā ia ke sputter non-conductive data. I ka manawa like, lawe pū ka pahu sputtering i ka sputtering reactive e hoʻomākaukau i ka ʻikepili hui e like me nā oxides, nitrides a me nā carbide. Inā piʻi ka alapine RF, e lilo ia i ka microwave plasma sputtering. I kēia manawa, hoʻohana maʻamau ka electron cyclotron resonance (ECR) microwave plasma sputtering.