Welina mai i kā mākou mau pūnaewele!

ʻO nā Kumukānāwai Sputtering Magnetron no nā Target Sputtering

Ua lohe paha nā mea hoʻohana he nui e pili ana i ka huahana o ka sputtering target, akā ʻaʻole ʻike ʻia ke kumu o ka sputtering target. Ano, ka lunahooponopono oMea Kūikawā waiwai (RSM) kaʻana like i nā loina o ka sputtering pahu hopu.

 https://www.rsmtarget.com/

Hoʻohui ʻia kahi māla magnetic orthogonal a me ka māla uila ma waena o ka sputtered target electrode (cathode) a me ka anode, ua hoʻopiha ʻia ke kinoea inert e koi ʻia (maʻamau Ar gas) i loko o ke keʻena haʻahaʻa kiʻekiʻe, ua hoʻokumu ʻia ka magnet mau loa he 250 ~ 350 Gauss magnetic field ma. ka ʻili o ka ʻikepili i hoʻopaʻa ʻia, a ua hoʻokumu ʻia ke kahua electromagnetic orthogonal me ke kahua uila uila kiʻekiʻe.

Ma lalo o ka hopena o ke kahua uila, ua hoʻopili ʻia ke kinoea Ar i loko o nā ion a me nā electrons. Hoʻohui ʻia kekahi volta kiʻekiʻe maikaʻi ʻole i ka pahuhopu. ʻO ka hopena o ke kahua magnetic ma nā electrons i hoʻokuʻu ʻia mai ka pou i hoʻopaʻa ʻia a me ka ionization probability o ka hoʻonui ʻana i ka hana kinoea, e hana ana i kahi plasma kiʻekiʻe kokoke i ka cathode. Ma lalo o ka hopena o Lorentz ikaika, Ar ions e hoʻokēʻai aku i ka ʻili i hoʻopaʻa ʻia a hoʻopaʻa i ka ʻili i hoʻopaʻa ʻia i ka wikiwiki kiʻekiʻe loa, ʻO nā ʻātoma sputtered ma luna o ka pahu hopu e hahai i ke kumu hoʻololi momentum a lele lele mai ka ʻili i kuhi ʻia i ka substrate me ka ikehu kinetic kiʻekiʻe. e waiho i na kii.

Hoʻokaʻawale ʻia ka hoʻoheheʻe Magnetron i ʻelua mau ʻano: Tributary sputtering a me RF sputtering. He mea maʻalahi ke kumu o nā mea hoʻoheheʻe ʻana i ka tributary, a wikiwiki hoʻi kona wikiwiki i ka wā e hoʻoheheʻe ai i ka metala. Hoʻohana nui ʻia ka RF sputtering. Ma waho aʻe o ka sputtering mea conductive, hiki ke sputter non-conductive mea. I ka manawa like, hana pū ia i ka sputtering reactive e hoʻomākaukau i nā mea o nā oxides, nitrides, carbide a me nā mea hoʻohui ʻē aʻe. Inā hoʻonui ʻia ka alapine RF, e lilo ia i ka microwave plasma sputtering. I kēia manawa, hoʻohana maʻamau ka electron cyclotron resonance (ECR) microwave plasma sputtering.


Ka manawa hoʻouna: Mei-31-2022