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Ke hana ʻana i kahi kumu daimana polycrystalline me ka hoʻohana ʻana i ka etchant paʻakikī FeCoB

ʻO kahi noiʻi hou i loko o ka puke pai ʻo Diamond and Related Materials e pili ana i ka etching o polycrystalline daimana me FeCoB etchant e hana i nā kumu. Ma muli o kēia mau hana ʻenehana i hoʻomaikaʻi ʻia, hiki ke loaʻa nā ʻili daimana me ka ʻole o ka pōʻino a me ka liʻiliʻi o nā hemahema.
Noiʻi: ʻO ke kālai ʻia ʻana o ke daimana ma ke kūlana paʻa me ka hoʻohana ʻana i ka FeCoB me kahi kiʻi kiʻi kiʻi. Kiʻi kiʻi: Bjorn Wilezic/Shutterstock.com
Ma o ke kaʻina diffusion solid-state, FeCoB nanocrystalline films (Fe: Co: B=60:20:20, atomic ratio) hiki ke hoʻokō i ka lattice targeting a me ka hoʻopau ʻana i nā daimana i ka microstructure.
Loaʻa i nā daimana nā hiʻohiʻona biochemical a me nā hiʻohiʻona, a me ka elasticity kiʻekiʻe a me ka ikaika. ʻO kona lōʻihi loa he kumu nui o ka holomua i ka mīkini hana ultra precision (diamond huli ʻenehana) a me ke ala i nā koʻikoʻi koʻikoʻi ma ka laulā o nā haneli GPa.
ʻO ka impermeability kemika, ka lōʻihi o ka nānā a me ka hana biological e hoʻonui i ka hiki ke hoʻolālā i nā ʻōnaehana e hoʻohana ana i kēia mau ʻano hana. Ua hana ʻo Diamond i kahi inoa nona iho ma ka ʻoihana mechatronics, optics, sensors a me ka hoʻokele data.
I mea e hiki ai i kā lākou noi, ʻo ka hoʻopaʻa ʻana i nā daimana a me kā lākou kumu hoʻohālike e hana i nā pilikia maopopo. Reactive ion etching (RIE), inductively coupled plasma (ICP), a me electron beam induced etching, he mau la'ana ia o na papa hana e hoohana ana i na hana etching (EBIE).
Hoʻokumu pū ʻia nā hale daimana me ka hoʻohana ʻana i nā ʻenehana hana laser a me ka focused ion beam (FIB). ʻO ka pahuhopu o kēia ʻano hana hana ʻo ia ka wikiwiki ʻana i ka delamination a me ka ʻae ʻana i ka scaling ma luna o nā wahi nui i nā hale hana holomua. Ke hoʻohana nei kēia mau kaʻina hana i nā etchants wai (plasma, gases, a me nā hāʻina wai), e kaupalena ana i ka paʻakikī geometric hiki ke loaʻa.
Ke noiʻi nei kēia hana hoʻoheheʻe honua i ka hoʻopau ʻana i nā mea ma o ka hana ʻana i ka mahu a hana i ka daimana polycrystalline me FeCoB (Fe: Co: B, 60:20:20 atomic pakeneka) ma ka ʻili. Hāʻawi ʻia ka manaʻo nui i ka hoʻokumu ʻana i nā hiʻohiʻona TM no ka etching pololei ʻana o nā hale mika mika i nā daimana. Hoʻopili ʻia ke daimana lalo i ka nanocrystalline FeCoB e ka mālama wela ma 700 a 900 ° C no 30 a 90 mau minuke.
Hōʻike ʻia kahi ʻāpana paʻa o kahi laʻana daimana i kahi microstructure polycrystalline lalo. He 3.84 ± 0.47 nm ka roughness (Ra) i loko o kēlā me kēia ʻāpana, a he 9.6 ± 1.2 nm ka huina o ka ʻili. ʻO ka roughness (i loko o hoʻokahi hua daimana) o ka papa metala FeCoB i hoʻokomo ʻia he 3.39 ± 0.26 nm, a ʻo ke kiʻekiʻe o ka papa he 100 ± 10 nm.
Ma hope o ka annealing ma 800 ° C no 30 min, ua hoʻonui ʻia ka mānoanoa o ka metala i 600 ± 100 nm, a ua hoʻonui ʻia ka roughness ili (Ra) i 224 ± 22 nm. I ka wā o ka hoʻopili ʻana, hoʻoheheʻe ʻia nā ʻātoma kalapona i loko o ka papa FeCoB, e hoʻonui ai i ka nui.
ʻEkolu mau laʻana me nā ʻāpana FeCoB 100 nm mānoanoa i hoʻomehana ʻia ma nā mahana o 700, 800, a me 900°C. Ke emi ka mahana ma lalo o 700°C, ʻaʻohe pilina koʻikoʻi ma waena o ke daimana a me FeCoB, a liʻiliʻi loa nā mea i wehe ʻia ma hope o ka mālama ʻana i ka hydrothermal. Hoʻonui ʻia ka wehe ʻana o nā mea a hiki i ka wela ma luna o 800 °C.
I ka hiki ʻana o ka mahana i 900°C, ua piʻi ʻelua ka nui o ka etching e hoʻohālikelike i ka mahana o 800 °C. Eia naʻe, ʻokoʻa loa ka ʻaoʻao o ka ʻāina i hoʻopaʻa ʻia me nā kaʻina etch implanted (FeCoB).
Hōʻike kiʻi kiʻi kiʻi o kahi etchant mokuʻāina paʻa no ka hana ʻana i kahi ʻano: Etch state solid state etching o daimana me ka hoʻohana ʻana i ka FeCoB kiʻi kiʻi kiʻi. Kiʻi kiʻi: Van Z. a me Shankar MR et al., Diamonds a me nā mea pili.
Ua hana ʻia nā ʻāpana FeCoB 100 nm mānoanoa ma nā daimana ma 800°C no 30, 60, a me 90 mau minuke.
Ua hoʻoholo ʻia ka roughness (Ra) o ka wahi i kahakaha ʻia ma ke ʻano he hana o ka manawa pane ma 800 ° C. ʻO ka paʻakikī o nā laʻana ma hope o ka annealing no 30, 60 a me 90 mau minuke he 186 ± 28 nm, 203 ± 26 nm a me 212 ± 30 nm. Me ka hohonu etch o 500, 800, a i ʻole 100 nm, ʻo ka lakio (RD) o ka ʻawaʻawa o ka wahi i kahakaha ʻia i ka hohonu etch ʻo 0.372, 0.254, a me 0.212.
ʻAʻole e piʻi nui ka ʻawaʻawa o ka wahi i kālai ʻia me ka hoʻonui ʻana i ka hohonu etching. Ua ʻike ʻia ʻo ka mahana e pono ai no ka pane ʻana ma waena o ka daimana a me HM etchant ma mua o 700°C.
Hōʻike nā hopena o ke aʻo ʻana hiki i ka FeCoB ke wehe pono i nā daimana ma kahi wikiwiki ʻoi aku ka wikiwiki ma mua o Fe a i ʻole Co wale nō.
    


Ka manawa hoʻouna: ʻAukake-31-2023