Nā mea e pono ai no ka molybdenum sputtering target

I kēia mau lā, nui nā hoaaloha i nīnau e pili ana i nā ʻano o ka molybdenum sputtering targets. I ka ʻoihana uila, i mea e hoʻomaikaʻi ai i ka pono sputtering a hōʻoia i ka maikaʻi o nā kiʻiʻoniʻoni i waiho ʻia, he aha nā koi no nā hiʻohiʻona o nā pahuhopu molybdenum sputtering? I kēia manawa e wehewehe mai nā loea loea mai RSM iā mākou.

　　1. Maemae

ʻO ka hoʻomaʻemaʻe kiʻekiʻe kahi mea e pono ai ka molybdenum sputtering target. ʻO ke kiʻekiʻe o ka maʻemaʻe o ka molybdenum target, ʻoi aku ka maikaʻi o ka hana o ke kiʻi sputtered. ʻO ka maʻamau, ʻo ka maʻemaʻe o ka molybdenum sputtering target e pono ma ka liʻiliʻi loa he 99.95% (kahi hapa nui, like ma lalo). Eia naʻe, me ka hoʻomaikaʻi mau ʻana o ka nui o ka substrate aniani i ka ʻoihana LCD, pono e hoʻonui ʻia ka lōʻihi o ka uea a ʻoi aku ka lahilahi o ka laina laina. I mea e hōʻoia ai i ke kūlike o ke kiʻiʻoniʻoni a me ka maikaʻi o ka wili, pono e hoʻonui ʻia ka maʻemaʻe o ka molybdenum sputtering target e like me ia. No laila, e like me ka nui o ka sputtered glass substrate a me ka hoʻohana ʻana, pono ka maʻemaʻe o ka molybdenum sputtering target e 99.99% - 99.999% a i ʻole ke kiʻekiʻe.

Hoʻohana ʻia ka molybdenum sputtering target ma ke ʻano he kumu cathode i ka sputtering. ʻO nā haumia i loko o ka paʻa a me ka oxygen a me ka wai i loko o nā pores nā kumu haumia nui o nā kiʻiʻoniʻoni i waiho ʻia. Eia kekahi, i ka ʻoihana uila, no ka mea, ua maʻalahi nā ion metala alkali (Na, K) e lilo i mau ion mobile i loko o ka papa insulation, ua hoʻemi ʻia ka hana o ka mea mua; ʻO nā mea e like me ka uranium (U) a me ka titanium (TI) e hoʻokuʻu ʻia i ka α X-ray, e hopena i ka haki ʻana o nā mea hana; ʻO ka hao a me ka nickel ion e hoʻoulu i ka leakage interface a hoʻonui i nā mea oxygen. No laila, i ka hoʻomākaukau ʻana o ka molybdenum sputtering target, pono e hoʻomalu pono ʻia kēia mau mea haumia e hōʻemi i kā lākou ʻike i loko o ka pahuhopu.

　　2. Ka nui o ka palaoa a me ka mahele nui

ʻO ka maʻamau, ʻo ka molybdenum sputtering target he polycrystalline structure, a ʻo ka nui o ka palaoa hiki ke piʻi mai ka micron a millimeter. Hōʻike nā hopena hoʻokolohua ʻoi aku ka wikiwiki o ka sputtering o ka pahu huaʻai maikaʻi ma mua o ka pahu kīʻaha coarse; No ka pahu hopu me ka ʻokoʻa liʻiliʻi o ka palaoa, ʻoi aku ka like o ka māhele mānoanoa o ke kiʻi i waiho ʻia.

　　3. ʻO ka hoʻonohonoho kristal

Ma muli o ka maʻalahi o ka hoʻoheheʻe ʻia ʻana o nā ʻātoma i makemake ʻia ma ke ala o ka hoʻonohonoho kokoke loa o nā ʻātoma i ka ʻaoʻao hexagonal i ka wā o ka sputtering, i mea e hoʻokō ai i ka nui o ka sputtering kiʻekiʻe, hoʻonui pinepine ʻia ka nui o ka sputtering ma o ka hoʻololi ʻana i ke ʻano aniani o ka pahu hopu. ʻO ka ʻaoʻao aniani o ka pahu hopu hoʻi he mana nui i ka like ʻana o ka mānoanoa o ke kiʻi sputtered. No laila, he mea koʻikoʻi loa ka loaʻa ʻana o kahi ʻano pahu pahu pahu aniani no ke kaʻina sputtering o ke kiʻiʻoniʻoni.

　　4. Hoʻopaʻapaʻa

I ke kaʻina hana o ka sputtering coating, i ka wā e hoʻokuʻu ʻia ai ka pahu sputtering me ka haʻahaʻa haʻahaʻa, ua hoʻokuʻu koke ʻia ke kinoea e noho nei i loko o nā pores o loko o ka pahu hopu, e hopena i ka paʻi ʻana o nā mea nui a i ʻole nā ​​​​particle, a i ʻole nā ​​mea kiʻiʻoniʻoni. e nā electrons lua ma hope o ka hoʻokumu ʻia ʻana o ke kiʻiʻoniʻoni, ka hopena i ka pāpaʻi ʻana i nā ʻāpana. ʻO ke ʻano o kēia mau ʻāpana e hōʻemi i ka maikaʻi o ke kiʻiʻoniʻoni. I mea e hōʻemi ai i nā pores i loko o ka paʻa paʻa a hoʻomaikaʻi i ka hana kiʻiʻoniʻoni, pono ka sputtering target e loaʻa i kahi kiʻekiʻe kiʻekiʻe. No ka molybdenum sputtering target, ʻoi aku ka nui o kona ʻano ma mua o 98%.

　　5. Hoʻopaʻa i ka pahu hopu a me ka chassis

ʻO ka maʻamau, pono e hoʻopili ʻia ka pahu molybdenum sputtering me ke keleawe manuahi oxygen (a i ʻole alumini a me nā mea ʻē aʻe) chassis ma mua o ka sputtering, i maikaʻi ka conductivity thermal o ka pahuhopu a me nā chassis i ka wā o ka sputtering kaʻina. Ma hope o ka hoʻopaʻa ʻana, pono e hoʻokō ʻia ka nānā ʻana o ka ultrasonic e hōʻoia i ka liʻiliʻi o ka wahi paʻa ʻole o nā mea ʻelua ma mua o 2%, i mea e hoʻokō ai i nā koi o ka sputtering kiʻekiʻe me ka hāʻule ʻole.