Welina mai i kā mākou mau pūnaewele!

FeTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Tantalum hao

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

FeTa

Huina

Tantalum hao

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO ka wehewehe ʻana o ka Iron Tantalum Sputtering Target

ʻO ka hao Tantalum alloy kahi mea kūpono no nā kumu evaporation, nā paipu electron, nā mea prosthetic, a me nā mea hoʻoponopono. Hoʻohana mākou i ka ʻenehana kiʻekiʻe o ka hoʻolei ʻana a me ka hoʻopaʻa paʻa wikiwiki ʻana e kiʻi i ka alloy Fe-Ta me ka hoʻomaʻemaʻe kiʻekiʻe a me ke ʻano homogenous. ʻO ka pahuhopu a mākou e hana ai he mau waiwai mechanical maikaʻi loa a hiki ke hana i nā papa ʻili i hoʻomaʻemaʻe ʻia.

Iron Tantalum Sputtering Target Packaging

Hoʻopili ʻia kā mākou Iron Tantalum sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.

Loaʻa i ka Hoʻokaʻaʻike

ʻO RSM's Iron Tantalum sputtering targets he ultra-high clean and uniform. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.

Hiki iā mākou ke hāʻawi i nā ʻano geometric like ʻole: tubes, arc cathodes, planar a i hana maʻamau. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, microstructure homogeneous, ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores, a me nā māwae.

Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.


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