FeTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Tantalum hao
ʻO ka wehewehe ʻana o ka Iron Tantalum Sputtering Target
ʻO ka hao Tantalum alloy kahi mea kūpono no nā kumu evaporation, nā paipu electron, nā mea prosthetic, a me nā mea hoʻoponopono. Hoʻohana mākou i ka ʻenehana kiʻekiʻe o ka hoʻolei ʻana a me ka hoʻopaʻa paʻa wikiwiki ʻana e kiʻi i ka alloy Fe-Ta me ka hoʻomaʻemaʻe kiʻekiʻe a me ke ʻano homogenous. ʻO ka pahuhopu a mākou e hana ai he mau waiwai mechanical maikaʻi loa a hiki ke hana i nā papa ʻili i hoʻomaʻemaʻe ʻia.
Iron Tantalum Sputtering Target Packaging
Hoʻopili ʻia kā mākou Iron Tantalum sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.
Loaʻa i ka Hoʻokaʻaʻike
ʻO RSM's Iron Tantalum sputtering targets he ultra-high clean and uniform. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai.
Hiki iā mākou ke hāʻawi i nā ʻano geometric like ʻole: tubes, arc cathodes, planar a i hana maʻamau. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, microstructure homogeneous, ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores, a me nā māwae.
Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.