Welina mai i kā mākou mau pūnaewele!

FeSi Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Silika hao

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

FeSi

Huina

Silika hao

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO ka hao Silicon alloy ka mea maʻamau i ka Silicon content o 0.5-4%. He haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa ma mua o ka hao maʻemaʻe a me ka resistivity kiʻekiʻe, a hiki ke hoʻopili ʻia i ke kahua magnetic. I mea e hōʻemi ai i ka nalowale o kēia manawa, ua ʻōwili pinepine ʻia ka hao Silicon alloy i loko o nā pepa 0.35-0.5mm (silicon lamination). Hoʻohana nui ʻia ka lamination silikoni i ka ʻoihana uila, no laila ua kapa ʻia ʻo ia ke kila uila.

Hāʻawi ka Ferrosilicon alloy i ka waiwai magnetic maikaʻi loa a me ka magnetization saturation haʻahaʻa. Loaʻa iā ia ka nui o ka palaoa, ka permeability magnetic kiʻekiʻe a me ka resistivity, ka ikaika coercive haʻahaʻa a me ka poho kumu. Hiki i ka Silicon ke hoʻoikaika i ka graphitization o Carbon i ke kila a pale maikaʻi i ka hanana ʻelemakule. He kūpaʻa kiʻekiʻe ka ferrosilicon alloy a hiki ke hoʻohana ʻia i kahi kaiapuni.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Iron Silicon Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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