Welina mai i kā mākou mau pūnaewele!

FeCu Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Ke keleawe hao

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

FeCu

Huina

Ke keleawe hao

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤2000mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO ka pahu hao Copper sputtering target he Copper based alloy me ka hoʻohui o ka hao. Loaʻa iā ia ka hana homogenous a me ka hopena deoxidation nui. Hiki ke hoʻohana ʻia nā mea liʻiliʻi o ka honua laʻa e like me ka mea hoʻomaʻemaʻe palaoa i loko o ka hao hao hao.

Hiki i ka Iron Copper alloy ke hāʻawi i ka ikaika kiʻekiʻe a me ka corrosion maikaʻi loa a me ke kūpaʻa ʻana. Hoʻohana maʻamau ia ma ke ʻano he kumu alakaʻi, uea fuse a me ke kikowaena hui.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hao hao keleawe e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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