Welina mai i kā mākou mau pūnaewele!

FeCoTa Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Iron Cobalt Tantalum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

FeCoTa

Huina

Iron Cobalt Tantalum

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

Loaʻa nā pahu pahu hao Cobalt Tantalum ma ke ʻano pōʻai a me nā mea kiʻiʻoniʻoni lahilahi koʻikoʻi o ka media hoʻopaʻa leo magnetic vertical. ʻO ka nui o ka Tantalum i loaʻa i loko o ka huila e hopena i ka hoʻokaʻawale ʻana a hōʻike i nā mea i hoʻoheheʻe ʻole ʻia. Hoʻohana mākou i ke ʻano hana kūʻokoʻa e hiki ai ke hōʻoia i ka homogeneity o ka microstructure a hoʻomaikaʻi i nā waiwai mechanical o nā mea.

inoa huahana

FeCoTa

Fe/wt%

Kaulike

Kaulike

Kaulike

Co/wt%

21.6±0.5

21.9±0.5

20.2±0.5

Ta/wt%

41.1±0.8

39.4±0.8

44.3±0.8

Maʻiʻo haumia metalappm)

Ni

≤100

≤100

≤100

Al

≤300

≤300

≤300

Si

≤200

≤200

≤200

Maʻiʻo haumia kinoeappm)

C

≤200

≤200

≤200

N

≤100

≤100

≤100

O

≤600

≤600

≤600

S

≤75

≤75

≤75

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Iron Cobalt Tantalum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


  • Mua:
  • Aʻe: