FeAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO ka maʻamau, ʻo ka hao Aluminum alloy sputtering target he 6% -16% maʻiʻo o Aluminum. Hōʻike ia i nā waiwai magnetic maikaʻi loa a hoʻohana pinepine ʻia i ka waiho ʻana o nā kiʻiʻoniʻoni o nā micromotors.
Hiki ke loaʻa maʻamau ka hao Aluminum alloys i nā ʻāpana me ka mānoanoa o 0.1-0.5mm. Hōʻike lākou i ka resistivity kiʻekiʻe, paʻakikī, vibration a me ke kūpaʻa hopena, i hui pū ʻia me ka haʻahaʻa haʻahaʻa（6.5~7.2g/m3）. ʻO nā koʻi hao i hana ʻia mai nā ʻāpana hao Aluminum he haʻahaʻa haʻahaʻa eddy a me ke kaumaha māmā.

Hoʻokaʻawale ʻia nā Aluminum Aluminum hao i: 1J6. 1J12. 1J16, ʻo ka helu ma hope o J ka mea o ka Aluminum. Me ka hoʻonui ʻana o ka ʻike Aluminum, e hoʻomaikaʻi ʻia ka conductivity magnetic a me ka resistivity o nā mea, aʻo ka saturation magnetic induction - hoʻemi ʻia.
ʻO Rich Special Materials kūikawā i ka Hana ʻana i ka Sputtering Target a hiki ke hana i ka hao Aluminum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.