CuCr Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO Copper Chromium alloy sputtering target kahi mea Cu-based me ka Chromium element i hoʻohui ʻia i loko. Loaʻa iā ia ka ikaika mechanical a me ka paʻakikī, ka uila maikaʻi a me ka conductivity wela. Ua loaʻa iā Cu-Cr alloy nā ʻano noi like ʻole e hana ana i nā mea hana ma lalo o nā wela kiʻekiʻe ma muli o kāna mau hiʻohiʻona kikoʻī: kūpono i ka wela kiʻekiʻe, ka pale ʻana o ka oxidation, ka pale ʻana i ka corrosion a me ka machinability.

He kiʻekiʻe ka paʻakikī o nā mea Copper Chromium, pale i ka pale ʻana, ke kū ʻana o ke kuʻekuʻe, ka pale ʻana a me ka wela hoʻololi kiʻekiʻe. he ʻano ikehu hou. ʻAʻole pili ka trivalent chromium i ke olakino kanaka. He mea hoʻokele maʻamau nō hoʻi. Ua hoʻohana nui ʻia ʻo Copper Chromium i nā huahana Optoelectronic Technology, e like me ka panel touch, LCD a me nā cell solar.

Hiki i ka Rich Special Materials kahi mea hana o Sputtering Target ke hana i ka Copper Chromium Sputtering Materials e like me nā kikoʻī o nā mea kūʻai. No ka 'ike hou aku, e 'olu'olu e leka uila mai.