Welina mai i kā mākou mau pūnaewele!

CuAl Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Alumini keleawe

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CuAl

Huina

Alumini keleawe

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

ʻO ka pahu hoʻoheheʻe alumini keleawe he mea kūpono ia no ka nui o nā ʻoihana a me nā noi, ma muli o kona paʻakikī kiʻekiʻe, ka ikaika tensile a me ke kaumaha māmā. Loaʻa iā ia he 1-3% keleawe maʻamau a loaʻa nā waiwai kemika like me ka Aluminum. Loaʻa iā CuAl nā waiwai mechanical kiʻekiʻe, ka machinability maikaʻi loa, a me ke kūpono o ka wela kiʻekiʻe, no laila hiki ke lilo i mea kūpono no ka hana kiʻekiʻe Aluminum alloy. Hiki ke hoʻohana ʻia ka pahu hoʻomaʻemaʻe kiʻekiʻe CuAl alloy sputtering target ma kahi ākea o nā kahua ʻoihana mai semiconductor a me nā mea hana uila.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hana Copper Aluminum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores a me nā māwae. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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