CrSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

ʻO ka hana ʻana o Chronium Silicon Sputtering Targets e pili ana i nā pae aʻe:
1.Vacuum melting o Silicon a me Chronium e kiʻi i nā ʻanuʻu alloys.
2. Powder wili, paʻi a hoʻokuʻu.
3.Hot isostatic kaomi lapaʻau e kiʻi semi-hoʻopau huahana.
4. Machining i ka chromium-silicon alloy sputtering target material no ka loaʻa ʻana o ka chromium-silicon alloy sputtering target material.

Hoʻohana pinepine ʻia ʻo CrSi e like me ke kiʻi ʻoniʻoni kiʻekiʻe kiʻekiʻe, hōʻike ia i ke kūpaʻa kiʻekiʻe, kūpaʻa a me ka coefficient wela haʻahaʻa o ke kūʻē. Hiki iā Chronium a me Silicon ke hana i nā ʻāpana silicide e like me Cr3Si, Cr5Si3,, CrSi, CrSi2. ʻO ke kaʻina hana, haku mele a me ke kaʻina hana mālama wela o ke kiʻi CrSi e hoʻopilikia nui i kāna hana.

ʻO Rich Special Materials kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Chronium Silicon Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.