CrAlW Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Hana ʻia ʻo Chrome Aluminum Tungsten sputtering target e ka pauka metallurgy e hoʻokō ai i ka maʻemaʻe kiʻekiʻe, homogeneous microstructure, kiʻekiʻe kiʻekiʻe a me ka conductivity uila kiʻekiʻe.

ʻO Chrome Aluminum Tungsten alloy kahi mea kūpono no ka Interconnects a me nā ʻoihana electrodes. Loaʻa ka ʻili maʻemaʻe, ka nui deposition kiʻekiʻe, ka paʻakikī, ka ikaika dielectric, a hiki ke hui maikaʻi ʻia me ka mea substrate.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā Chronium Aluminum Tungsten Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. Hōʻike kā mākou huahana i ka maʻemaʻe kiʻekiʻe, ka hoʻolālā homogeneous, kiʻekiʻe kiʻekiʻe me ka ʻole o ka hoʻokaʻawale ʻana, nā pores a me nā māwae. No ka 'ike hou aku, e 'olu'olu e leka uila mai.