CrAlSi Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made
Kelepona Aluminum Silika
Chronium Aluminum Silicon Sputtering Target Wehewehe
ʻO ka hana ʻana o Chronium Aluminum Silicon Sputtering Targets e pili ana i nā pae aʻe:
1.Vacuum melting o Silicon, Aluminum a me Chronium no ka loaʻa ʻana o nā alloys step.
2. Powder wili a hui.
3.Hot isostatic kaomi lapaʻau no ka loaʻaʻana o ka chromium Aluminum silicon alloy sputtering pahu hopu.
Hoʻohana nui ʻia ʻo Chronium Aluminum Silicon Sputtering Targets i ka ʻoki ʻana i nā mea hana a me nā ʻōpala, ma muli o kona pale ʻana a me ke kūpaʻa ʻana o ka wela wela e hoʻomaikaʻi i ka hana kiʻiʻoniʻoni.
Hoʻokumu ʻia kahi ʻāpana amorphous Si3N4 i ka wā o ke kaʻina o PVD o nā pahuhopu CrAlSi. Ma muli o ka hoʻohui ʻia ʻana o ka pae amorphous Si3N4, hiki ke hoʻopaʻa ʻia ka ulu ʻana o ka nui o ka palaoa a hoʻomaikaʻi i ka waiwai kūpaʻa o ka wela wela.
Chronium Aluminum Silicon Sputtering Target Packaging
Hoʻopili ʻia kā mākou Chronium Aluminum Silicon sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. E mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha
Loaʻa i ka Hoʻokaʻaʻike
ʻO RSM's Chronium Aluminum Silicon sputtering targets he ultra-high clean and uniform. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai. Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.