Wholesale CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Manufacturer and Supplier

Chromium Aluminum

CrAl Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made Featured Image

ʻO ka wehewehe pōkole:

Māhele	Alloy Sputtering Target
ʻO ke kimekema	CrAl
Huina	Chromium Aluminum
Maemae	99.7%，99.9%，99.95%，99.99%
Kinohi	ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Kaʻina Hana Hana	ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM
Nui Loaʻa	L≤2000mm，W≤200mm

E hoʻouna i ka leka uila iā mākou

Huahana Huahana

ʻO ka hana ʻana o Chromium Aluminum Sputtering Targets e pili ana i nā pae aʻe:

1. ʻO ka pauka wili a me ka hui ʻana.

2. Hot isostatic kaomi lapaʻau e kiʻi semi-hoʻopau huahana.

3. Ka hana 'ana i ka chromium aluminum alloy sputtering target material no ka loa'a 'ana o ka chromium aluminum alloy sputtering target material.

I ka wā o ke kaʻina hana hoʻoheheʻe ʻana o nā pahuhopu CrAl sputtering, ua hoʻokumu ʻia kahi uhi paʻa Aluminium-Chrom-Nitrid (AlCrN). Hōʻike kēia uhi i ka paʻakikī kiʻekiʻe a me nā waiwai kūʻē o ka oxidation a hiki i ka wela kiʻekiʻe. Hiki i nā mea ʻoki ke holo i nā meaʻai kiʻekiʻe e hoʻonui i ka huahana a hoʻonui i ka maikaʻi i ka wā e hoʻohana ai i nā mīkini CNC.

ʻO kā mākou mau pahuhopu AlCr maʻamau a me kā lākou mau waiwai

	Cr-70Alma%	Cr-60Alma%	Cr-50Alma%
Maʻemaʻe (%)	99.8/99.9/99.95	99.8/99.9/99.95	99.8/99.9/99.95
ʻO ka mānoanoa（g/cm³）	3.7	4.35	4.55
Gua Nui(µm)	100/50	100/50	100/50
Kaʻina hana	HIP	HIP	HIP

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā lako alumini Chromium Sputtering e like me nā kikoʻī o nā mea kūʻai aku. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores a me nā māwae. No ka 'ike hou aku, e 'olu'olu e leka uila mai.

Mua: CoFe Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Aʻe: AlSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made