Cr Sputtering Target High Purity Thin Film PVD Coating Custom Made
Chromium
wikiō
ʻO ka wehewehe ʻana o ka Vanadium Sputtering
ʻO Chromium he metala paʻakikī a me ke kala me ke ʻano polū. Loaʻa i ka Chromium maʻemaʻe ka ductility a me ka paʻakikī. He 7.20g/cm3 kona mānoanoa, melting point o 1907 ℃ a me ka paila o 2671 ℃. Loaʻa i ka Chromium ke kūpaʻa corrosion kiʻekiʻe loa a me ka haʻahaʻa haʻahaʻa haʻahaʻa i ka wela kiʻekiʻe. Hoʻokumu ʻia ka metala Chromium ma o ke kaʻina aluminothermic mai ka chrome oxide a i ʻole ka hana electrolytic me ka hoʻohana ʻana i ka ferrochromium a i ʻole chromic acid.
Hiki ke hoʻohana ʻia nā pahu hoʻomaʻemaʻe Chromium sputtering kiʻekiʻe no nā noi maʻamau. ʻO nā uhi i waiho ʻia e nā pahu Chromium e hōʻike ana i ka ikaika nui a me ke ʻano kūʻē.
Hiki iā mākou ke hāʻawi iā Chromium i nā mea maʻemaʻe like ʻole
| Pmimi | Ihaumia(ppm)≤ | ||||||
| Fe | Si | Al | C | N | O | S | |
| 99.2 | 3000 | 2500 | 2000 | 200 | 500 | 2000 | 100 |
| 99.5 | 2000 | 2000 | 1200 | 200 | 500 | 1500 | 100 |
| 99.7 | 1200 | 1000 | 1000 | 200 | 300 | 1200 | 100 |
| 99.8 | 1000 | 800 | 600 | 200 | 200 | 1000 | 100 |
| 99.9 | 500 | 200 | 300 | 150 | 100 | 500 | 50 |
| 99.95 | 200 | 100 | 100 | 100 | 100 | 300 | 50 |
Noi no ka Chromium Sputtering Target
Hoʻohana ʻia ʻo Chromium sputter target i loko o nā noi vacuum he nui e like me nā uhi aniani kaʻa, ka hana ʻana o ke kelepona photovoltaic, ka hana ʻana i ka pākaukau, ka wahie cell, a me nā mea hoʻonaninani a me ka pale ʻana i ka corrosion. Hoʻohana ʻia ʻo Chromium sputtering target no CD-ROM, nā mea hoʻonaninani kiʻiʻoniʻoni ʻoniʻoni, nā hōʻike papa pālahalaha, ka uhi hana e like me ka maikaʻi o nā ʻoihana hoʻopaʻa ʻike optical ʻē aʻe, etc.
Hoʻopili ʻia ʻo Chromium Sputtering Target Packaging
Hoʻopaʻa ʻia kā mākou chromium sputter target a hoʻopaʻa inoa ʻia ma waho e hōʻoia i ka ʻike kūpono a me ka mana maikaʻi. Mālama nui ʻia e pale aku i nā pōʻino i hiki ke hana ʻia i ka wā mālama a lawe ʻia paha.
Loaʻa i ka Hoʻokaʻaʻike
Loaʻa ka maʻemaʻe kiʻekiʻe kiʻekiʻe a me ka lole kā RSM's Chromium sputtering target. Loaʻa iā lākou ma nā ʻano like ʻole, ka maʻemaʻe, ka nui, a me nā kumukūʻai. Hoʻomaʻamaʻa mākou i ka hana ʻana i nā mea hoʻoheheʻe kiʻi ʻoniʻoni maʻemaʻe kiʻekiʻe me ka hana maikaʻi loa e like me ke kiʻekiʻe kiʻekiʻe loa a me ka liʻiliʻi liʻiliʻi awelika nui o ka palaoa no ka hoʻohana ʻana i ka uhi ʻana i ka mold, hoʻonani, nā ʻāpana kaʻa, haʻahaʻa-E aniani, semi-conductor integrated circuit, thin film. kū'ē, hōʻike kiʻi, aerospace, hoʻopaʻa leo magnetic, pā paʻi, kiʻi ʻoniʻoni ʻoniʻoni ʻoniʻoni solar a me nā hoʻoheheʻe kino kino ʻē aʻe. (PVD) noi. E ʻoluʻolu e hoʻouna mai iā mākou i kahi nīnau no nā kumukūʻai o kēia manawa ma nā sputtering targets a me nā mea hoʻopaʻa ʻē aʻe ʻaʻole i helu ʻia.
