Welina mai i kā mākou mau pūnaewele!

keleawe

keleawe

ʻO ka wehewehe pōkole:

Māhele Metal Sputtering Target
ʻO ke kimekema Cu
Huina keleawe
Maemae 99.9%99.95%99.99%
Kinohi ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau
Pkaʻina hana Hoʻoheheʻe Vacuum
Nui Loaʻa L≤2000mm,W300mm

Huahana Huahana

Huahana Huahana

He 63.546 ke kaumaha o ke keleawe, ka mānoanoa 8.92g/cm³, ka helu heheʻe 1083.4±0.2 ℃, kahi paila 2567 ℃. He ʻulaʻula melemele ke ʻano kino a ke hoʻomaloʻo ʻia e ulu aʻe ka ʻōlinolino metala. Loaʻa ka paʻakikī kiʻekiʻe o ke keleawe, ke kūpaʻa ʻana, ka ductility maikaʻi, ka pale ʻana i ka corrosion, ka uila a me ka thermal conductivity. e hoʻohana ʻia i nā ʻano hana like ʻole. Loaʻa nā ʻāpana keleawe i nā waiwai mechanical maikaʻi loa a me ka haʻahaʻa haʻahaʻa, ʻo nā ʻāpana keleawe nui nā keleawe (copper/zinc alloys) a me nā keleawe (copper/tin alloys me nā bronzes alakaʻi a me nā bronzes phosphor). Ma waho aʻe, ʻo Copper kahi metala paʻa no ka mea kūpono loa i ka hana hou ʻana.

Hiki ke hoʻohana ʻia ke keleawe maʻemaʻe kiʻekiʻe ma ke ʻano he mea hoʻopaʻa no nā laina hoʻoili mana, nā uwila uila, nā uwea a me nā busbars, nā kaapuni hoʻohui nui, a me nā hōʻike papa pālahalaha.

Ka Hoʻomaʻemaʻe ʻana

Pmimi Ag Fe Cd Al Sn Ni S Huina
4Nppm 10 0.1 <0.01 0.21 0.1 0.36 3.9 0.005
5Nppm 0.02 0.02 <0.01 0.002 <0.005 0.001 0.02 0.1

ʻO Rich Special Materials kahi mea hana o Sputtering Target a hiki iā ia ke hana i nā lako Copper Sputtering me ka maʻemaʻe a hiki i 6N e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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