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CuMo Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Copper Molybdenum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CuMo

Huina

Copper Molybdenum

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

PM

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hana ʻia ka pahu hoʻoheheʻe Copper Molybdenum e ka infiltration sintering. Loaʻa i ka Copper Molybdenum alloy nā waiwai kino a me nā mechanical: maikaʻi ka uila a me ka thermal conductivity, haʻahaʻa a hiki ke hoʻololi ʻia o ka hoʻonui ʻana i ka wela, ke kūpaʻa ʻana, a me ka ikaika wela kiʻekiʻe.

Nā haku mele (%)

Cu

Mo

haumia (%)

MoCu10

10±2

Kaulike

≤0.1

MoCu15

15±3

Kaulike

≤0.1

MoCu20

20±3

Kaulike

≤0.1

MoCu25

25±3

Kaulike

≤0.1

MoCu40

40±5

Kaulike

≤0.1

ʻO Rich Special Materials kūikawā i ka Hana ʻana i ka Sputtering Target a hiki ke hana i nā Copper Molybdenum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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