CoFeV Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Loaʻa i ka Cobalt Iron Vanadium sputtering target he 52% maʻiʻo o Cobalt, 9% -23% maʻiʻo o Vanadium a me ke koena - ductile permanent-magnetic material. Hōʻike ia i ka hiki ke hoʻololi i ka plastik maikaʻi a hiki ke hana ʻia i mau ʻāpana me nā ʻano paʻakikī.

ʻO ka Cobalt Iron Vanadium alloy sputtering target he kiʻekiʻe loa ka saturation flux density Bs (2.4T) a me ka mahana Curie (980 ~ 1100 ℃). Hiki ke kōkua i ka ho'ēmi kaumaha a hiki ke hoʻomaikaʻi i ke kūpaʻa ma nā mahana kiʻekiʻe. He mea kūpono ia no nā mea uila uila (nā mīkini uila kūikawā liʻiliʻi, electromagnet a me ka relay uila). Loaʻa iā ia ka coefficient saturation magnetostriction kiʻekiʻe, a hiki ke hana i ka transducer magnetostrictive.

Loaʻa nā waiwai kūikawā waiwai i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Cobalt Iron Vanadium Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.