Welina mai i kā mākou mau pūnaewele!

CoFeTaZr Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Iron Tantalum Zirconium

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CoFeTaZr

Huina

Cobalt Iron Tantalum Zirconium

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hoʻokumu ʻia ka Cobalt Iron Tantalum Zirconium sputtering target ma o ka hoʻoheheʻe ʻana. Hiki i kēia kaʻina hana ke pale pono i nā mea nui mai ka oxidation a hōʻoia i ka microstructure homogenous, ka nui o ka palaoa a me ke kūlike kiʻekiʻe o nā kiʻiʻoniʻoni i waiho ʻia.

Ma hope o ka hoʻomaʻamaʻa wela, hiki ke hoʻomaikaʻi maikaʻi ʻia ka PTF o ka pahuhopu, no laila hoʻohana pinepine ʻia no ka mea ʻenekini palupalu palupalu i nā papa hoʻopaʻa leo magnetic perpendicular.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i ka Cobalt Iron Tantalum Zirconium Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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