Welina mai i kā mākou mau pūnaewele!

CoCrTa Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Cobalt Chromium Tantalum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

CoCrTa

Huina

Cobalt Chromium Tantalum

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

Hoʻoheheʻe Vacuum

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hana ʻia ʻo Cobalt Chromium Tantalum sputtering target e ke kaʻina hoʻolei a me ka hoʻoheheʻe ʻana. a laila hana ʻia i ke ʻano i makemake ʻia. Loaʻa iā ia ka maʻemaʻe kiʻekiʻe a me ka microstructure homogenous. Ua lilo ʻo Co-Cr-Ta i mea koʻikoʻi no ka hoʻopaʻa ʻana i ka magnetic no kāna mau waiwai magnetic: kiʻekiʻe coercivity, haʻahaʻa haʻahaʻa haʻahaʻa haʻahaʻa a me ka maikaʻi loa.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hoʻoheheʻe Cobalt Chromium Tantalum e like me nā kikoʻī o nā mea kūʻai aku. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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