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AlTa Sputtering Target High Purity Thin Film PVD Coating Custom Made

Aluminum-Tantalum

ʻO ka wehewehe pōkole:

Māhele

Alloy Sputtering Target

ʻO ke kimekema

AlTa

Huina

Aluminum-Tantalum

Maemae

99.9%,99.95%,99.99%

Kinohi

ʻO nā pā, nā pahu pahu, nā cathodes arc, hana maʻamau

Kaʻina Hana Hana

ʻO ka hoʻoheheʻe ʻia ʻana o ka ʻuala, PM

Nui Loaʻa

L≤200mm,W≤200mm


Huahana Huahana

Huahana Huahana

Hoʻomākaukau ʻia nā pahuhopu ma o ka hui ʻana i nā pauka Aluminum a me Tantalum a i ʻole ka hoʻoheheʻe ʻana i ka māmā a ukali ʻia e ka hoʻopili ʻana i ka piha piha. Hoʻopili ʻia nā mea i hoʻopaʻa ʻia a laila hoʻokumu ʻia i ke ʻano i makemake ʻia.

Aluminum Tantalum sputtering pahu hopu i kiʻekiʻe maemae, homogeneous microstructure a maikai conductivity. Hoʻohana nui ʻia ia i ka hoʻokumu ʻana i nā kiʻiʻoniʻoni lahilahi no ka ʻoihana hōʻike papa pālahalaha. Hiki ke hoʻohui pū ʻia ka Aluminum Tantalum e hana i ka hana kiʻekiʻe Titanium alloy e hoʻomaikaʻi i kona kūpono kiʻekiʻe-mehana.

Maʻiʻo haumia o Al-Ta alloy

haku mele

Maʻiʻo%)

Ta

Fe

Si

C

O

AlTa60

55.0~65.0

≤0.05

≤0.02

≤0.01

≤0.05

AlTa70

65.0~75.0

≤0.05

≤0.02

≤0.01

≤0.05

ʻO Rich Special Materials specializes in the Manufacturing of Sputtering Target a hiki ke hana Aluminum Tantalum Sputtering Materials e like me nā kikoʻī o nā mea kūʻai aku. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores a me nā māwae. No ka 'ike hou aku, e 'olu'olu e leka uila mai.


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