AlSiCu Alloy Sputtering Target High Purity Thin Film Pvd Coating Custom Made

Hana ʻia ka Aluminum Silicon Copper alloy ma ke ʻano o ka hoʻoheheʻe ʻana a me ka ʻenehana deformation. Loaʻa iā ia ka maʻemaʻe kiʻekiʻe, ka microstructure homogeneous a me ka nui o ka palaoa i hoʻomaʻemaʻe ʻia a hoʻohana ʻia i ka nui o nā noi a me nā ʻoihana, me ka PVD coating, vacuum furnace component, X ray sputtering targets. ʻO ia hoʻi nā mea uhi no ka Large Scale Integrated Circuit no kāna hui kūʻokoʻa o nā hiʻohiʻona i makemake ʻia, me ke kaumaha māmā, ka conductivity thermal maikaʻi, ka paʻakikī, ka paʻakikī a me ka pale ʻana i ka corrosion.

Loaʻa nā waiwai kūikawā i ka hana ʻana i ka Sputtering Target a hiki ke hana i nā mea hoʻoheheʻe alumini keleawe keleawe e like me nā kikoʻī o nā mea kūʻai aku. ʻO kā mākou huahana e hōʻike ana i nā waiwai mechanical maikaʻi loa, ka hoʻolālā homogeneous, ka ʻili poli me ka ʻole o ka hoʻokaʻawale ʻana, nā pores a me nā māwae. No ka 'ike hou aku, e 'olu'olu e leka uila mai.