AlSi Alloy Sputtering Target High Purity Thin Film PVD Coating Custom Made

Hoʻomākaukau ʻia nā pahuhopu ma ka hui ʻana i nā pauka Aluminum a me Silicon i ukali ʻia e ka hoʻopili ʻana i ka piha piha. Hoʻopili ʻia nā mea i hoʻopaʻa ʻia a laila hoʻokumu ʻia i ke ʻano i makemake ʻia. Loaʻa kā mākou Aluminum Silicon sputtering targets i loko o ka rectangular, circular or custom-made geometric forms, Aluminum content from 10-90% atomic, and feature high clean, homogeneous microstructure, high density and long working life.

Hoʻohana nui ʻia ʻo Aluminum Silicon i nā ʻoihana kaʻa, nā mokulele a me nā ʻoihana kūkulu hale no kāna hui kūʻokoʻa o nā hiʻohiʻona i makemake ʻia, e like me ke kaumaha māmā, ka conductivity thermal maikaʻi a me nā waiwai mechanical. ʻO ka mānoanoa o kēia mea he 2.6 ~ 2.7g / cm3, koena conductivity wela 101 ~ 126W / (m · ℃), modulus tensile 71.0GPa, palena luhi ± 45MPa. Loaʻa i nā ʻāpana alumini-siliconi maikaʻi ke kūpaʻa corrosion, machinability, a me ka weldability. Hoʻohana ʻia nā ʻāpana alumini-silicona i nā ʻano o ka automotive, aerospace, a me nā noi huahana mea kūʻai aku, e like me nā poloka engine a me nā liner cylinder, pistons, nā mea hao hao, a me nā mea uila mea kūʻai aku.+2. Loaʻa iā ia kahi helu heheʻe kiʻekiʻe, ductility, paʻakikī, a me ka pale ʻana i ka corrosion.