Menene sputter manufa abu

Magnetron sputtering shafi ne wani sabon jiki tururi shafi hanya, idan aka kwatanta da a baya evaporation shafi hanya, da abũbuwan amfãni a da yawa fasali ne quite na ƙwarai. A matsayin babbar fasaha, an yi amfani da sputtering magnetron a fagage da yawa.

　　Ka'idar sputtering Magnetron:

Ana ƙara filin maganadisu na orthogonal da filin lantarki tsakanin sandar manufa ta sputtered (cathode) da anode, kuma iskar da ake buƙata ta inert (yawanci Ar gas) yana cika a cikin babban ɗaki. Wurin maganadisu na dindindin yana samar da filin maganadisu 250-350 a saman abin da aka yi niyya, kuma filin lantarki na orthogonal yana kunshe da babban filin lantarki. A karkashin tasirin wutar lantarki, Ar gas ionization zuwa ions masu kyau da electrons, manufa kuma yana da matsa lamba mara kyau, daga maƙasudin daga sandar ta hanyar tasirin filin magnetic da haɓaka yuwuwar gas mai aiki, samar da babban plasma mai yawa kusa da cathode, Ar ion a ƙarƙashin aikin lorentz ƙarfi, saurin tashi zuwa saman da aka yi niyya, bama-bamai da aka yi niyya a babban saurin, Atom ɗin da aka watsar akan manufa suna bin ka'idar juyawa mai ƙarfi tashi daga wurin da aka yi niyya tare da babban kuzarin motsa jiki zuwa fim ɗin jigon ƙasa.

Gabaɗaya sputtering Magnetron ya kasu kashi biyu: sputtering DC da RF sputtering. Ka'idar kayan aikin sputter na DC abu ne mai sauƙi, kuma ƙimar yana da sauri lokacin zubar da ƙarfe. Amfani da RF sputtering ya fi yawa, ban da sputtering conductive kayan, amma kuma sputtering kayan da ba conductive, amma kuma amsa sputtering shirye-shirye na oxides, nitrides da carbides da sauran mahadi kayan. Idan mitar RF ya karu, ya zama mai zubar da jini na microwave. A halin yanzu, nau'in resonance na electron cyclotron (ECR) ana yawan amfani da sputtering plasma sputtering.

　　Magnetron sputtering shafi manufa abu:

Karfe sputtering manufa abu, shafi gami sputtering shafi abu, yumbu sputtering shafi abu, boride yumbu sputtering manufa kayan, carbide yumbu sputtering manufa abu, fluoride yumbu sputtering manufa abu, nitride yumbu sputtering manufa kayan, oxide yumbu manufa, selenide yumbu sputtering abu, silicide yumbu sputtering manufa kayan, sulfide yumbu sputtering manufa abu, Telluride yumbu sputtering manufa, sauran yumbu manufa, chromium-doped silicon oxide yumbu manufa (CR-SiO), indium phosphide manufa (InP), gubar arsenide manufa (PbAs), indium arsenide manufa (InAs).