Yanzu masu amfani da yawa sun fahimci nau'ikan hari daaikace-aikacen sa, amma sashinsa na iya zama ba a bayyane sosai ba. Yanzu bari muInjiniyan RSM raba tare da kuwasu induction na magnetron sputtering hari.
Sputtering manufa: karfe sputtering shafi manufa, gami sputtering shafi manufa, yumbu sputtering shafi manufa, boride yumbu sputtering manufa, carbide yumbu sputtering manufa, fluoride yumbu sputtering manufa, nitride yumbu sputtering manufa, oxide yumbu sputtering manufa, oxide yumbu manufa, selenide yumbu sputtering manufa, selenide yumbu sputtering manufa. manufa, sulfide yumbura manufa sputtering, telluride yumbu sputtering manufa, sauran yumbu hari, Chromium doped silicon oxide yumbu manufa (CR SiO), indium phosphide manufa (INP), gubar arsenide manufa (pbas), indium arsenide manufa (InAs).
Gabaɗaya sputtering Magnetron ya kasu kashi biyu: sputtering DC da RF sputtering. Ka'idar kayan aikin sputter na DC abu ne mai sauƙi, kuma ƙimar sa kuma yana da sauri lokacin zubar da ƙarfe. Ana amfani da sputtering RF ko'ina. Baya ga watsa bayanan gudanarwa, kuma yana iya watsa bayanan da ba su da iko. Hakanan za'a iya amfani da maƙasudin sputtering don yin sputtering mai amsawa don shirya bayanan fili kamar oxides, nitrides da carbides. Idan mitar RF ta ƙaru, zai zama mai zubar da jini na microwave. A halin yanzu, electron cyclotron resonance (ECR) microwave sputtering plasma ana yawan amfani dashi.
Lokacin aikawa: Mayu-26-2022