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A aikace da ka'idar sputtering manufa

Game da aikace-aikace da ka'idar sputtering fasahar fasaha, wasu abokan ciniki sun tuntubi RSM, yanzu don wannan matsala da ta fi damuwa da , ƙwararrun ƙwararrun fasaha suna raba wasu takamaiman ilimin da suka danganci.

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  Aikace-aikacen manufa mai yatsa:

Cajin ɓangarorin (irin su argon ions) suna jefa bama-bamai da ƙarfi, suna haifar da barbashi na sama, kamar su atom, ƙwayoyin cuta ko daure su tsere daga saman abin al'amarin da ake kira "sputtering". A magnetron sputtering shafi, da tabbatacce ions generated da argon ionization yawanci amfani da su bombard da m (manufa), da sputtered tsaka tsaki atom ana ajiye a kan substrate (workpiece) don samar da wani fim Layer. Magnetron sputtering shafi yana da halaye biyu: "ƙananan zafin jiki" da "sauri".

  Ka'idar sputtering Magnetron:

Ana ƙara filin maganadisu na orthogonal da filin lantarki tsakanin sandar manufa ta sputtered (cathode) da anode, kuma iskar da ake buƙata ta inert (yawanci Ar gas) yana cika a cikin babban ɗaki. Wurin maganadisu na dindindin yana samar da filin maganadisu na Gauss 250-350 akan saman abin da aka yi niyya, kuma yana samar da filin lantarki na orthogonal tare da babban filin lantarki.

A karkashin aikin filin lantarki, Ar gas yana ionized zuwa ions masu kyau da kuma electrons, kuma akwai wani mummunan matsa lamba akan abin da ake nufi, don haka electrons da ke fitowa daga igiyoyin da aka yi niyya suna shafar filin Magnetic da yiwuwar ionization na aiki. gas yana ƙaruwa. Ana samar da plasma mai girma a kusa da cathode, kuma Ar ions suna hanzarta zuwa farfajiyar da aka yi niyya a ƙarƙashin aikin Lorentz kuma suna jefar da saman da aka yi niyya a cikin babban sauri, don haka ƙwayoyin zarra masu sputtered akan manufa su tsere daga wurin da aka niyya tare da babba. kuzarin motsa jiki da tashi zuwa ga ma'aunin don samar da fim bisa ga ka'idar jujjuyawar hanzari.

Gabaɗaya sputtering Magnetron ya kasu kashi biyu: sputtering DC da RF sputtering. Ka'idar kayan aikin sputter na DC abu ne mai sauƙi, kuma ƙimar yana da sauri lokacin zubar da ƙarfe. Amfani da RF sputtering ya fi yawa, ban da sputtering conductive kayan, amma kuma sputtering kayan da ba conductive, amma kuma amsa sputtering shirye-shirye na oxides, nitrides da carbides da sauran mahadi kayan. Idan mitar RF ya karu, ya zama mai zubar da jini na microwave. A halin yanzu, nau'in resonance na electron cyclotron (ECR) ana yawan amfani da sputtering plasma sputtering.


Lokacin aikawa: Agusta-01-2022